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Recent articles have focused much effort on studying the stochastic behavior of secondary electron exposure of EUV resists [1-4]. Here, we consider the implications of extending similar treatments to DUV lithography.
As before, the model uses pixel-by-pixel calculations of absorbed photon dose, followed… Read More
During my research I found an interview with Don Brooks from February 2000. It was very interesting and confirmed some of the things I knew about Don and brought up a few things I did not know. It’s an hour but it is a video of Don telling his story and is definitely worth a look. One of the things that was not mentioned however is the… Read More
Dan is joined by Carl Moore, a semiconductor and yield management expert with a career spanning 40 years. Carl’s held technical management positions across product and test engineering, assembly, manufacturing, and design at established semiconductor companies. Carl is passionate about data analytics and has a reputation… Read More
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I have historically avoided mixed signal topics, assuming they decouple from digital and can be left to the experts. That simple view no longer holds water. Analog and digital are becoming more closely linked through control loops and datapaths, requiring a careful balancing act in verification between performance, accuracy… Read More
Introduction
The ever-growing demand for faster, smaller, and more efficient electronic devices has fueled the semiconductor industry’s relentless pursuit of innovation. One crucial technology at the heart of semiconductor manufacturing is Extreme Ultraviolet Lithography (EUVL) to achieve smaller feature sizes… Read More
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