Podcast EP364: The Broad Impact of Advanced Mask Solutions, Today and Tomorrow with Dr. Germain Fenger
Daniel is joined by Dr. Germain Fenger, Senior Director of Product Management at Synopsys where he leads advanced mask solutions and computational lithography technologies. With a background spanning semiconductor manufacturing, lithography research, engineering, and product leadership, Germain has held roles at imec, GlobalFoundries, Mentor Graphics, Siemens EDA, and Synopsys. He holds a Ph.D. in Microsystems, has authored more than 80 publications, and holds multiple patents in the field.
Daniel explores the broad class of problems that advanced mask solutions are addressing with Germain. Topics such as inverse lithography, curvilinear masks, and machine learning are all discussed in detail. Germain explains how these and other technologies bridge the gap between what designers want to build and what the manufacturing process can reliably print. He explains how advanced mask solutions are now becoming part of the production manufacturing flow vs. a special experiment.
Advanced collaboration with Nvidia and TSMC is also described, as well as an assessment of what the future of advanced mask making will look like.
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