Array

Instance

Array
(
    [title] => Recent Forum Threads
    [title_url] => 
    [ignore_sticky] => 0
    [exclude_current] => 0
    [limit] => 10
    [sluglist] => ["jobs-dashboard"]
    [rw_opt] => Array
        (
            [widget_select] => 1
            [pageid_281769] => 1
            [pageid_281772] => 1
        )

    [display_widget_mobile] => 
    [rw_opt_exclude] => Array
        (
            [pageid_274493] => 1
            [cpt_podcast] => 1
            [cpta_podcast] => 1
            [category_16613] => 1
            [category_16631] => 1
            [taxonomy_series] => 1
        )

    [node_id] => Array
        (
            [0] => 2
        )

)

Threads

SPIE Photomask Technology + Extreme Ultraviolet Lithography

Name: SPIE Photomask Technology + Extreme Ultraviolet Lithography
Start: 2024-09-29T00:00:00-07:00
End: 2024-10-03T23:59:59-07:00
Location: Monterey Conference Center

September 29 - October 3

Make plans for the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection and repair, mask business, extreme UV lithography, and emerging technologies.

Present your research in Monterey, 29 September – 3 October 2024. Call for papers opens in January

Join your technical community

Come to Monterey, California for the technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.

Learn more about the free exhibition

A return to the Monterey Convention Center. Companies offer an inside look into their portfolio of products and services, and connections are made in one-on-one conversations with company representatives.

REGISTER HERE

Share this post via:

Details

Start:: September 29
End:: October 3
Event Tags:: lithography, monterey, photomask, spie, technology, ultraviolet
Website:: https://spie.org/conferences-and-exhibitions/photomask-technology-and-extreme-ultraviolet-lithography?SSO=1

Organizer

: SPIE
: View Organizer Website

Venue

: Monterey Conference Center
: 1 Portola Plaza
Monterey, CA 93940 United States + Google Map

Real men have fabs!
Samsung is the dominant foundry and capex is likely spent more effective in conjunction with the IDM part of the…

— Claus Aasholm on April 24, 2024
Real men have fabs!
We track many more companies than what you see in the chart. Our insight model requires input data and Siemens…

— Claus Aasholm on April 24, 2024
Real men have fabs!
Under EDA you should add Siemens, Keysight EDA, etc.

— Daniel Payne on April 24, 2024
Real men have fabs!
Curious about the last chart - why is Korea's CapEx:Revenue ratio for foundry so much lower than all the others…

— Peter Bennet on April 24, 2024
Huawei’s and SMIC’s Requirement for 5nm Production: Improving Multipatterning Productivity
Yes, with damascene the cuts are blocks. The arrangement of the two etch materials like oxide and nitride comes about…

— Fred Chen on April 23, 2024
Huawei’s and SMIC’s Requirement for 5nm Production: Improving Multipatterning Productivity
Interesting round up Fred. Given how the Damascene process works, my understanding is that you can't do cuts you have…

— nghanayem on April 23, 2024
ASML- Soft revenues & Orders – But…China 49% – Memory Improving
What does "the street" base their projections on? Would "the street" like to see ASML jacking up their prices as…

— Barnsley on April 22, 2024
ASML- Soft revenues & Orders – But…China 49% – Memory Improving
DUV will not go away, KrF sales show that. Even the I-line is still present. High-NA EUV has not been…

— Fred Chen on April 20, 2024

Search Semiwiki

Recent Forum Threads

Recent Article Comments