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Effect of Design on Transistor Density

Effect of Design on Transistor Density
by Scotten Jones on 05-26-2020 at 10:00 am

TSMC N7 Density Analysis SemiWiki

I have written a lot of articles looking at leading edge processes and comparing the process density. One comment I often get are that the process density numbers I present do not correlate with the actual transistor density on released products. A lot of people want to draw conclusions an Intel’s processes versus TSMC’s processes… Read More


Contact Resistance: The Silent Device Scaling Barrier

Contact Resistance: The Silent Device Scaling Barrier
by Fred Chen on 05-24-2020 at 6:00 am

Contact Resistance The Silent Device Scaling Barrier

Moore’s Law has been about device density, specifically transistor density, increasing every certain number of years. Although cost is the most easily grasped advantage, there are two other benefits: higher performance (speed) and reduced power. When these benefits are compromised, they can also pose a scaling limitation.

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Collaboration Flow for Moore’s Law versus More than Moore

Collaboration Flow for Moore’s Law versus More than Moore
by Herb Reiter on 05-20-2020 at 10:00 am

Figure 1 Foundry

The current Coronavirus crisis is inflicting a lot of pain on people, companies, and governments. I hope I am not getting in trouble with my reasoning, but if you look closely, there are also some “positives” to the Covid-19 crisis.

– It is stress-testing our infrastructure and telling us where we need to improve – as country,… Read More


Cost Analysis of the Proposed TSMC US Fab

Cost Analysis of the Proposed TSMC US Fab
by Scotten Jones on 05-19-2020 at 10:00 am

TSMC US Fab SemiWiki

On May 15th TSMC “announced its intention to build and operate an advanced semiconductor fab in the United States with the mutual understanding and commitment to support from the U.S. federal government and the State of Arizona.”

The fab will run TSMC’s 5nm technology and have a capacity of 20,000 wafers per month (wpm). Construction… Read More


The Uncertain Phase Shifts of EUV Masks

The Uncertain Phase Shifts of EUV Masks
by Fred Chen on 05-13-2020 at 10:00 am

The Uncertain Phase Shifts of EUV Masks

EUV (Extreme UltraViolet) lithography has received attention within the semiconductor industry since its development inception in 1997 with the formation of the EUV LLC [1], and more recently, since the 7nm node began, with limited use by Samsung and TSMC being touted as key advantages [2, 3]. As with any key critical technology,

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Our US chip foundry comments confirmed by WSJ

Our US chip foundry comments confirmed by WSJ
by Robert Maire on 05-11-2020 at 10:00 am

Trump Intel TSMC China TAiwan

-Could GloFo come back?
-TSMC or Intel or both or neither?
Samsung would be a long shot?
Perhaps Apple could convince TSMC?

The Wall Street Journal put out an article that detailed what we had indicated in our newsletter 10 days ago, that the US government is looking at getting a US based foundry to protect our interests… Read More


MOSFET Gate Length Scaling Limit at Reduced Threshold Voltages

MOSFET Gate Length Scaling Limit at Reduced Threshold Voltages
by Fred Chen on 05-10-2020 at 6:00 am

MOSFET Gate Length Scaling Limit at Reduced Threshold Voltages

As transistor dimensions shrink to follow Moore’s Law, the functionality of the gate used to switch on or off the current is actually being degraded by the short channel effect (SCE) [1-5]. Moreover, the simultaneous reduction of voltage aggravates the degradation, as will be discussed below.

A Practical Lower Limit ofRead More


Reliable Line Cutting for Spacer-based Patterning

Reliable Line Cutting for Spacer-based Patterning
by Fred Chen on 05-06-2020 at 6:00 am

Reliable Line Cutting for Spacer based Patterning

Spacer-defined patterning is an expected requirement for advanced semiconductor patterning nodes with feature sizes of 25 nm or less. As the required gaps between features go well below the lithography tool’s resolution limit, the use of cut exposures to separate features is used more often, especially in chips produced… Read More


TSMC’s Advanced IC Packaging Solutions

TSMC’s Advanced IC Packaging Solutions
by Herb Reiter on 05-01-2020 at 10:00 am

Fig 3 TSMC Adv Pkg blog

TSMC as Pure Play Wafer Foundry
TSMC started its wafer foundry business more than 30 years ago. Visionary management and creative engineering teams developed leading-edge process technologies and their reputation as trusted source for high-volume production. TSMC also recognized very early the importance of building an … Read More


Lithography Resolution Limits: Line End Gaps

Lithography Resolution Limits: Line End Gaps
by Fred Chen on 05-01-2020 at 6:00 am

0 13

In a previous article [1], the Rayleigh criterion was mentioned as the resolution limit for the distance between two features. On the other hand, in a following article [2], the minimum pitch was mentioned for the resolution limit for arrayed features. In this article, we reconcile the two by considering gaps between arrayed features,… Read More