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TSMC Sets the Stage for a Great 2021!

TSMC Sets the Stage for a Great 2021!
by Daniel Nenni on 10-16-2020 at 10:00 am

TSMC Revenue Analysis 2020

TSMC is the bellwether for not just the semiconductor industry but the worldwide economy. TSMC makes semiconductors, semiconductors are where electronics begin and electronics are the foundation of modern life, absolutely.

Apple is also a key economic indicator and as we all know Apple is a strategic partner of TSMC. The Apple… Read More


From Moore’s Law to Moortec’s Law!

From Moore’s Law to Moortec’s Law!
by Tim Penhale-Jones on 09-20-2020 at 10:00 am

Moortecs Law

No-one likes being put on the spot and yet we all like a forecast…and as we all know, the only guarantee with a forecast is that it is wrong. Sports commentators have carved out a special niche for themselves with the ‘commentators curse’, just as they extol the virtues of an individual or a team, the sporting gods prove them wrong in … Read More


Imec Technology Forum and ASML

Imec Technology Forum and ASML
by Scotten Jones on 07-30-2020 at 6:00 am

itf usa 2020 martin van den brink Page 15

On Thursday July 9 Imec held a virtual technology forum. Imec is one of the premier research organizations working on semiconductor technology and their forums are always interesting. My area of interest is process technology and the following are my observation in that area from the forum.

Luc Van Den Hove
Luc Van Den Hove is the… Read More


Designing AI Accelerators with Innovative FinFET and FD-SOI Solutions

Designing AI Accelerators with Innovative FinFET and FD-SOI Solutions
by Daniel Nenni on 07-29-2020 at 10:00 am

Globalfoundries AI Webinar Hiren Majmudar

I had the pleasure of spending time with Hiren Majmudar in preparation for the upcoming AI Accelerators webinar. As far as webinars go this will be one of the better ones we have done. Hiren has deep experience in both semiconductors and EDA during his lengthy career at Intel and now with a pure play foundry. He is intelligent, personable,… Read More


How About a Faster Fast SPICE? Much Faster!

How About a Faster Fast SPICE? Much Faster!
by Tom Simon on 07-22-2020 at 10:35 am

Analog FastSPICE eXTreme

When Analog FastSPICE was first introduced in 2006 it changed the landscape for high performance SPICE simulation. During the last 14 years it has been used widely to verify advanced nanometer designs. Of course, since then the most advanced designs have progressed significantly, making verification even more difficult. Just… Read More


Staying on the Right Side in Worst Case Conditions – Performance (Part 2)

Staying on the Right Side in Worst Case Conditions – Performance (Part 2)
by Tim Penhale-Jones on 07-02-2020 at 10:00 am

Moortec Part 2 Talking Sense

In this, the second part of a two-part series we delve further into defining worst case, this time focusing specifically on device performance.

In the last blog we talked about the steady increase in power density per unit silicon area and how worst case is definitely getting worse. We discussed how in each new FinFET node the dynamic… Read More


Contact over Active Gate Process Requirements for 5G

Contact over Active Gate Process Requirements for 5G
by Tom Dillinger on 07-01-2020 at 6:00 am

frequency 5G

Summary
A recent process enhancement in advanced nodes is to support the fabrication of contacts directly on the active gate area of a device.  At the recent VLSI 2020 Symposium, the critical advantages of this capability were highlighted, specifically in the context of the behavior of RF CMOS devices needed for 5G designs.

IntroductionRead More


Multi-Vt Device Offerings for Advanced Process Nodes

Multi-Vt Device Offerings for Advanced Process Nodes
by Tom Dillinger on 06-26-2020 at 6:00 am

Ion Ioff

Summary
As a result of extensive focus on the development of workfunction metal (WFM) deposition, lithography, and removal, both FinFET and gate-all-around (GAA) devices will offer a wide range of Vt levels for advanced process nodes below 7nm.

Introduction
Cell library and IP designers rely on the availability of nFET and pFET… Read More


Design Technology Co-Optimization (DTCO) for sub-5nm Process Nodes

Design Technology Co-Optimization (DTCO) for sub-5nm Process Nodes
by Tom Dillinger on 06-23-2020 at 6:00 am

scaled metal resistance

Summary
Design Technology Co-Optimization (DTCO) analysis was pursued for library cell PPA estimates for gate-all-around (GAA) devices and new metallurgy options.  The cell design and process recommendations are a bit surprising.

Introduction
During the “golden years” of silicon technology evolution that applied Dennard… Read More


Feature-Selective Etching in SAQP for Sub-20 nm Patterning

Feature-Selective Etching in SAQP for Sub-20 nm Patterning
by Fred Chen on 06-02-2020 at 10:00 am

Feature Selective Etching in SAQP for Sub 20 nm Patterning

Self-aligned quadruple patterning (SAQP) is the most widely available technology used for patterning feature pitches less than 38 nm, with a projected capability to reach 19 nm pitch. It is actually an integration of multiple process steps, already being used to pattern the fins of FinFETs [1] and 1X DRAM [2]. These steps, shown… Read More