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Choosing the lesser of 2 evils EUV vs Multi Patterning!

Choosing the lesser of 2 evils EUV vs Multi Patterning!
by Robert Maire on 11-03-2017 at 12:00 pm

For Halloween this week we thought it would be appropriate to talk about things that strike fear into the hearts of semiconductor makers and process engineers toiling away in fabs. Do I want to do multi-patterning with the huge increase in complexity, number of steps, masks and tools or do I want to do EUV with unproven tools, unproven… Read More


Arm TechCon Preview with the Foundries!

Arm TechCon Preview with the Foundries!
by Daniel Nenni on 10-23-2017 at 9:00 am

This week Dr. Eric Esteve, Dr. Bernard Murphy, and I will be blogging live from Arm TechCon. It really looks like it will be a great conference so you should see some interesting blogs in the coming days. One of the topics I am interested in this year is foundation IP and I will tell you why.

During the fabless transformation of the semiconductor… Read More


Breakfast with Aart de Geus and the Foundries!

Breakfast with Aart de Geus and the Foundries!
by Daniel Nenni on 09-06-2017 at 7:00 am

Being the number one EDA and the number one IP company does have its advantages and the resulting foundry relationships are a clear example. One of the DAC traditions that I truly enjoy is the Synopsys foundry breakfasts. Not only does Synopsys welcome scribes, they reserve a table up front for us and Synopsys CEO Aart de Geus has been… Read More


Semicon West – The FDSOI Ecosystem

Semicon West – The FDSOI Ecosystem
by Scotten Jones on 07-21-2017 at 12:00 pm

At Semicon West last week I attended presentations by Soitec and CEA Leti, and had breakfast with CEA Leti CEO Marie Semeria, key members of the Fully Depleted Silicon On Insulator (FDSOI) ecosystem. I have also seen some comments in the SemiWiki forum lately that make me believe there is some confusion on the roles of different companies… Read More


Standard Node Trend

Standard Node Trend
by Scotten Jones on 07-15-2017 at 4:00 pm

I have previously published analysis’ converting leading edge logic processes to “standard nodes” and comparing standard nodes by company and time. Recently updated details on the 7nm process node have become available and in this article, I will revisit the standard node calculations and trends.… Read More


3D NAND Myths and Realities

3D NAND Myths and Realities
by Scotten Jones on 06-30-2017 at 9:00 am

For many year 2D NAND drove lithography for the semiconductor industry with the smallest printed dimensions and yearly shrinks. As 2D NAND shrunk down to the mid-teens nodes, 16nm, 15nm and even 14nm, the cells became so small that there were only a few electrons in each cell and cross-talk issues made further shrinks very difficult… Read More


Samsung Details Foundry Roadmap

Samsung Details Foundry Roadmap
by Scotten Jones on 06-09-2017 at 10:00 am

Samsung recently held a meeting where they laid out a detailed roadmap for their foundry business. On Tuesday June 1st, Daniel Nenni and myself had an interview with Kelvin Low, senior director of foundry marketing and business development to discuss the details of Samsung’s plans.… Read More


14nm 16nm 10nm and 7nm – What we know now

14nm 16nm 10nm and 7nm – What we know now
by Scotten Jones on 04-07-2017 at 7:00 am

Last week Intel held a manufacturing day where they revealed a lot of information about their 10nm process for the first time and information on competitor processes continues to slowly come out as well. I thought it would be useful to summarize what we know now, especially since some of what Intel announced was different than what… Read More


Shootout at 22nm!

Shootout at 22nm!
by Scotten Jones on 04-03-2017 at 4:00 pm

For an industry that drives improvement at an exponential rate it is funny how often something old is new again. Intel went into high volume production on 22nm in 2011, and TSMC and Samsung have both had 20nm technologies in production for several years. And yet, recently we have seen renewed interest in 22nm. GLOBALFOUNDRIES has… Read More


Intel Manufacturing Day: Nodes must die, but Moore’s Law lives!

Intel Manufacturing Day: Nodes must die, but Moore’s Law lives!
by Scotten Jones on 03-29-2017 at 4:00 pm

Yesterday I attended Intel’s manufacturing day. This was the first manufacturing day Intel has held in three years and according to Intel their most in depth ever.

Nodes must die
I have written several articles comparing process technologies across the leading-edge logic producers – GLOBALFOUNDRIES, Intel, Samsung… Read More