Cliff Hou’s DAC Keynote

Cliff Hou’s DAC Keynote
by Paul McLellan on 06-23-2014 at 10:21 am

Cliff Hou had two major appearances at DAC this year. He gave the opening day keynote…and he wrote the forward to Dan and my bookFabless: the Transformation of the Semiconductor Industry which about 1500 lucky people got a copy of courtesy of several companies, most notably eSilicon who sponsored the Tuesday evening post-conference… Read More


The Rosetta Stone of Lithography

The Rosetta Stone of Lithography
by Paul McLellan on 11-20-2013 at 3:14 pm

At major EDA events, CEDA (the IEEE council on EDA, I guess you already know what that bit stands for) hosts a lunch and presentation for attendees and others. This week was ICCAD and the speaker was Lars Liebmann of IBM on The Escalating Design Impact of Resolution-Challenged Lithography. Lars decided to give us a whirlwind tour … Read More


No EUV before 7nm?

No EUV before 7nm?
by Paul McLellan on 02-07-2013 at 1:31 pm

I was at the Common Platform Technology Forum this week. One of the most interesting sessions is IBM’s Gary Patton giving an overview of the state of semiconductor fabrication. Then, at lunchtime, he is one of the people that the press can question. In this post, I’m going to focus on Extreme Ultra-Violet (EUV) lithography.… Read More