Alchip moves from TSMC 7nm to 5nm!

Alchip moves from TSMC 7nm to 5nm!
by Daniel Nenni on 08-20-2020 at 10:00 am

Alchip 5nm TSMC

While Alchip is speeding its way down the TSMC process technology roadmap I am reminded how important services are to the semiconductor ecosystem. We can thank ASIC companies like Alchip for the heavy investment systems companies have made into semiconductors. We covered this in our book “Fabless: The Transformation of the SemiconductorRead More


SEMICON West – Applied Materials Selective Gap Fill Announcement

SEMICON West – Applied Materials Selective Gap Fill Announcement
by Scotten Jones on 08-17-2020 at 5:00 pm

Applied Materials Selective Gapfill July 2020 Page 02

At SEMICON West, Applied Materials announced a new selective gap fill tool to address the growing resistance issues in interconnect at small dimensions. I had the opportunity to discuss this new tool and the applications for it with Zhebo Chen global product manager in the Metal Deposition Products group at Applied Materials.… Read More


Multi-Vt Device Offerings for Advanced Process Nodes

Multi-Vt Device Offerings for Advanced Process Nodes
by Tom Dillinger on 06-26-2020 at 6:00 am

Ion Ioff

Summary
As a result of extensive focus on the development of workfunction metal (WFM) deposition, lithography, and removal, both FinFET and gate-all-around (GAA) devices will offer a wide range of Vt levels for advanced process nodes below 7nm.

Introduction
Cell library and IP designers rely on the availability of nFET and pFET… Read More


Effect of Design on Transistor Density

Effect of Design on Transistor Density
by Scotten Jones on 05-26-2020 at 10:00 am

TSMC N7 Density Analysis SemiWiki

I have written a lot of articles looking at leading edge processes and comparing the process density. One comment I often get are that the process density numbers I present do not correlate with the actual transistor density on released products. A lot of people want to draw conclusions an Intel’s processes versus TSMC’s processes… Read More


Can TSMC Maintain Their Process Technology Lead

Can TSMC Maintain Their Process Technology Lead
by Scotten Jones on 04-29-2020 at 10:00 am

TSMC Process Lead Slides 20200427 Page 1

Recently Seeking Alpha published an article “Taiwan Semiconductor Manufacturing Company Losing Its Process Leadership To Intel” and Dan Nenni (SemiWiki founder) asked me to take a look at the article and do my own analysis. This is a subject I have followed and published on for many years.

Before I dig into specific process density… Read More


SPIE 2020 – ASML EUV and Inspection Update

SPIE 2020 – ASML EUV and Inspection Update
by Scotten Jones on 04-20-2020 at 10:00 am

0.33 NA EUV systems for HVM Ron Schuurhuis Page 02

I couldn’t attend the SPIE Advanced Lithography Conference this year for personal reasons, but last week Mike Lercel of ASML was nice enough to walk me through the major ASML presentations from the conference.

Introduction
In late 2018, Samsung and TSMC introduced 7nm foundry logic processes with 5 to 7 EUV layers, throughout … Read More


LithoVision – Economics in the 3D Era

LithoVision – Economics in the 3D Era
by Scotten Jones on 03-04-2020 at 6:00 am

Slide3

Each year on the Sunday before the SPIE Advanced Lithography Conference, Nikon holds their LithoVision event. This year I had the privilege of being invited to speak for the third consecutive year, unfortunately, the event had to be canceled due to concerns over the COVID-19 virus but by the time the event was canceled I had already… Read More


IEDM 2019 – IBM and Leti

IEDM 2019 – IBM and Leti
by Scotten Jones on 01-08-2020 at 6:00 am

Slide3

IBM and Leti each presented several papers at IEDM including a joint nanosheet paper. I had the opportunity to sit down with Huiming Bu, director of advanced logic & memory tech and Veeraraghavan Basker, senior engineer from IBM and then in a separate interview Francois Andrieu, head of advanced CMOS laboratory and Shay Reboh,… Read More


IEDM 2019 – Applied Materials panel EUV Recap

IEDM 2019 – Applied Materials panel EUV Recap
by Scotten Jones on 12-23-2019 at 10:00 am

On Tuesday night of IEDM, Applied Materials held a panel discussion “The Future of Logic: EUV is Here, Now What?”. The panelists were: Regina Freed, managing director at Applied Materials as the moderator, Geoffrey Yeap, senior director of advanced technology at TSMC, Bala Haran, director of silicon process research at IBM, … Read More


IEDM 2019 – TSMC 5nm Process

IEDM 2019 – TSMC 5nm Process
by Scotten Jones on 12-16-2019 at 10:00 am

IEDM is in my opinion the premiere conference for information on state-of-the-art semiconductor processes. In “My Top Three Reasons to Attend IEDM 2019” article I singled out the TSMC 5nm paper as a key reason to attend.

IEDM is one of the best organized conferences I attend and as soon as you pick up your badge you are handed a memory… Read More