Captain America: Can Elon Musk Save America's Chip Manufacturing Industry?Intel has posted three consecutive years of falling…Read More
WEBINAR: Reclaiming Clock Margin at 3nm and BelowAt 3nm and below, clock networks have quietly…Read More
WEBINAR: HBM4E Advances Bandwidth Performance for AI TrainingThe rapid proliferation of LLMs and other AI…Read More
Siemens Wins Best in Show Award at Chiplet Summit and Targets Broad 3D IC Design EnablementThe recent Chiplet Summit in Santa Clara was…Read More
Siemens Fuse EDA AI Agent Releases to Orchestrate Agentic Semiconductor and PCB DesignThough terminology sometimes get fuzzy, consensus holds that…Read More
Near the end of Tennessee Williams’ “A Streetcar Named Desire” the Blanche DuBois character, who has suffered a mental breakdown following an implied rape, tells the doctor and matron who have come to take her to the hospital: “Whoever you are – I have always depended on the kindness of strangers.” Sadly, this is the… Read More
DesignCon 2022 is back to a live conference, from Tuesday, April 5th through Thursday, April 7th, at the Santa Clara Convention Center.
DesignCon is a unique gathering in our industry. Its roots incorporated a focus on complex design and analysis requirements of (long-reach) high-speed interfaces. Technical… Read More
Dan is joined by Hugo Saleh, senior VP of commercial operations and managing director of Ayar Labs, UK. Hugo discusses the technology and application of optical I/O, its use and impact now and in the future.
The views, thoughts, and opinions expressed in these podcasts belong solely to the speaker, and not to the speaker’s employer,… Read More
-New PUV light source will push litho into Angstrom Era
-Rare earth elements shortages add to supply chain woes
-Could strategic wafer reserve releases lower memory pricing
-Can we cut off/turn off Russian access to chip equipment?
DUV, EUV and now “PUV” to become next generation lithography
Lithography is the locomotive… Read More
This interview is with Kelly Peng, Co-founder, and CEO of Kura Technologies. Kura Gallium, Kura’s first product, was named Best of CES 2022 and received a 2022 CES Innovation Award as well. Kelly is an inventor, engineer and entrepreneur that leads a team of dedicated innovators that are redefining the term “Augmented Reality”.… Read More
“A picture is worth a thousand words” is a widely known adage across the world. Recognizing patterns and cycles becomes easier when data is presented pictorially. Naturally, data visualization technology has a long history from the early days, when people used a paper and pencil to graph data, to modern day visualization platforms.… Read More
Everyone saw Shift Left, the EDA blockbuster. Digital logic design, with perfect 1s and 0s simulated through perfect switches, shifted into a higher gear. But the dark arts – RF systems, power supplies, and high-speed digital – didn’t shift smoothly. What do these practitioners need in EDA to see more benefits from shift left? … Read More
There’s been a lot of discussion and hype regarding use of the cloud for chip design for quite a while, more than ten years I would say. I spoke with Synopsys to better understand their recent Synopsys Cloud announcement to determine if it is different. Briefly, it is different, and here is why:
If you’re trying to design a complex SoC,… Read More
We normally test only for correctness of the functionality we expect. How can we find functionality (e.g. Trojans) that we don’t expect? Paul Cunningham (GM, Verification at Cadence), Raúl Camposano (Silicon Catalyst, entrepreneur, former Synopsys CTO and now Silvaco CTO) and I continue our series on research ideas. As always,… Read More
Domain specific processors are a mega-trend in the semiconductor industry, so we see new three letter acronyms like DPU, for Data Processing Unit. System level performance can actually be improved by moving some of the tasks away from the CPU. Companies like Xilinx (Alveo), Amazon (Nitro) and NVIDIA (BlueField) have been talking… Read More
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Chemical Origins of Environmental Modifications to MOR Lithographic Chemistry