You are currently viewing SemiWiki as a guest which gives you limited access to the site. To view blog comments and experience other SemiWiki features you must be a registered member. Registration is fast, simple, and absolutely free so please, join our community today!
Is the 1.8 million referring to P60 or Mate 60? The P60 is using the Snapdragon 8+ indeed, but that is not domestic. One analyst predicted Huawei to sell only 60 million (across all models) this year: https://www.reuters.com/technology/chinas-huawei-start-selling-pura-70-smartphones-2024-04-18/...
It looks like the Pura 70 forecast of 10.4 million domestically generated would be too optimistic compared to the P60 only 1.8 million generated from TSMC? Aside, Huawei Mate 60 allegedly crossed 30 million, is that disputed?
HONG KONG/SHENZHEN/SHANGHAI, April 18 (Reuters) - Chinese technology giant Huawei started selling two models of its highly anticipated, high-end Pura 70 smartphone series on Thursday that many analysts expect to contain an advanced China-made chip like its Mate 60 handset.
The Pura series...
High-NA customers need some strategy for the mask as well. Multilayer, absorber, and Intel now wants to change mask size as well (they didn't plan it with ASML earlier)?
"High NA EUV is the next-generation lithography system developed by ASML following decades of collaboration with Intel."
A misleading statement from Intel, as if they co-owned it for decades.
HS: understood. Checking the most recent CAR (probably more mainstream) literature, more or less the same trend toward reported sizing dose being higher, quite often significantly, than 30 mJ/cm2...
They had doses as high as over 80 mJ/cm2 here https://www.spiedigitallibrary.org/conference-proceedings-of-spie/12957/129570V/Patterning-optimization-for-single-mask-bit-line-periphery-and-storage/10.1117/12.3010934.full#_=_ when MOR was used.
ASML did report on NXE:3800E getting >500W (but <505W): https://www.spiedigitallibrary.org/conference-proceedings-of-spie/12953/129530V/High-power-EUV-light-sources-500w-for-high-throughput-in/10.1117/12.3010463.full#_=_
But TSMC earlier talked about pellicles not surviving long enough at 400W...
The higher NA only improves the resolution of the so-called aerial image (image in space) not the actual resist image. The resist image contrast is limited further by photoelectrons, which can travel as far as 15 nm (in one direction) in one evaluated resist.
They also didn't mention that in...
