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Search results

  1. F

    TSMC Repurposing Old Fabs to Bring EUV Pellicle Production In-House

    I refer to this paper https://www.spiedigitallibrary.org/conference-proceedings-of-spie/12750/127500N/EUV-pellicle-technology-for-high-volume-wafer-production/10.1117/12.2688127.short where TSMC reported changing EUV pellicle materials 3 times in 2020-2023. But at 400W, the 2023 material was...
  2. F

    TSMC Repurposing Old Fabs to Bring EUV Pellicle Production In-House

    Besides being expensive on their own, EUV pellicles limited throughput due to transmission as well as rupturing or destabilizing faster at higher power. So pellicle-less procedures have been developed. DUV pellicles are much cheaper and do not limit throughput this way but still need to deal...
  3. F

    TSMC's back-side power supply A16 is coming soon, and Nvidia is expected to be the first to adopt it despite the high price.

    Depth of focus is the bane of High-NA. But stochastics and pellicles are the banes of EUV.
  4. F

    Intel's 14nm+++ desktop CPUs are making a comeback — chipmaker inexplicably resurrects Comet Lake from five years ago with 'new' Core i5-110

    Apparently Comet Lake and some other processors were discontinued as of July 1st this year, so they're just renaming a discontinued product as a bookkeeping formality?
  5. F

    Intel's 14nm+++ desktop CPUs are making a comeback — chipmaker inexplicably resurrects Comet Lake from five years ago with 'new' Core i5-110

    By Zhiye Liu published 2 days ago So, should we call this 10th Gen or Core Series 1? It appears that Intel is experiencing a sense of nostalgia, as the chipmaker (via momomo_us) has introduced the Core i5-110 processor, based on Comet Lake. Comet Lake is a stroll down memory lane for many of...
  6. F

    Qualcomm CEO: Intel is not an option today. We would like Intel to be an option

    What's in PDK 1.0 that the tape-outs don't have?
  7. F

    Synopsys stock down by more than 1/3

    This didn't age well: https://investor.synopsys.com/news/news-details/2025/Synopsys-and-Intel-Foundry-Propel-Angstrom-Scale-Chip-Designs-on-Intel-18A-and-Intel-18A-P-Technologies/default.aspx
  8. F

    TSMC Repurposing Old Fabs to Bring EUV Pellicle Production In-House

    IP shut-out, plus you need an EUV system to test out the pellicles.
  9. F

    TSMC Repurposing Old Fabs to Bring EUV Pellicle Production In-House

    Mitsui Chemicals licensed technology from ASML and IMEC to produce EUV pellicles which they sell. Samsung and TSMC have published their ongoing evaluation efforts. TSMC has gone so far to set up its own EUV pellicle infrastructure in preparation for producing its own pellicles for its own use...
  10. F

    Qualcomm CEO: Intel is not an option today. We would like Intel to be an option

    He's suggesting IFS worse than Samsung, that's really something.
  11. F

    Intel: “No Change in Glass Substrate Adoption by 2030”

    Very unclear article source: https://www.etnews.com/20250910000245 However, it remains unclear whether Intel will procure glass substrates in-house or through external collaboration. Mass production requires significant investment, and multiple manufacturers are needed to ensure a stable...
  12. F

    Intel CFO confirms that 14A will be more expensive than 18A due to High-NA EUV tool

    The practical resolution is determined by stochastics not NA.
  13. F

    SK Hynix adopts next-generation HNA-EUV ASML production equipment for DRAM

    It looks like they made an array, although not mentioning the array size or dimensions.
  14. F

    SK Hynix adopts next-generation HNA-EUV ASML production equipment for DRAM

    SK Hynix did 5 layers for VLSI 2024: https://www.businesskorea.co.kr/news/articleView.html?idxno=219741
  15. F

    Samsung does not use EUV pellicles; FST in talks with Samsung to supply EUV pellicle

    I found an interesting excerpt from here: https://globaltechresearch.substack.com/p/carbon-nanotube-cnt-the-next-big Not only do memory manufacturers not use EUV pellicles, but even TSMC tries not to use EUV pellicles too much in their advanced node process, due to their high cost (over $10,000...
  16. F

    SK Hynix adopts next-generation HNA-EUV ASML production equipment for DRAM

    Since there will be many layers (like in 3D NAND), the capacitors can be spaced further apart, not requiring the highest resolution anymore. The issue with 4-6 F^2 is that distances between different features that can couple capacitively are getting too close. For 4F^2, there is the additional...
  17. F

    Samsung does not use EUV pellicles; FST in talks with Samsung to supply EUV pellicle

    Without pellicles, periodic inspections are needed to infer particles on the mask before too many dies are lost. The inspection cost could force some yield risk to be accepted. https://www.researchgate.net/publication/331763063_Advanced_particle_contamination_control_in_EUV_scanners
  18. F

    SK Hynix adopts next-generation HNA-EUV ASML production equipment for DRAM

    The thing about 4F2 is it has a short runway. The channel material also seems not settled yet (also applies to 3D DRAM).
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