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The Need for Low Pupil Fill in EUV Lithography

The Need for Low Pupil Fill in EUV Lithography
by Fred Chen on 03-15-2020 at 10:00 am

The Need for Low Pupil Fill in EUV Lithography 1

Extreme ultraviolet (EUV) lithography targets sub-20 nm resolution using a wavelength range of ~13.3-13.7 nm (with some light including DUV outside this band as well) and a reflective ring-field optics system. ASML has been refining the EUV tool platform, starting with the NXE:3300B, the very first platform with a numerical

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SPIE 2020 – Applied Materials Material-Enabled Patterning

SPIE 2020 – Applied Materials Material-Enabled Patterning
by Scotten Jones on 03-13-2020 at 10:00 am

2020 SPIE Media Briefing Full Slides for Scott Jones Page 16

I wasn’t able to attend the SPIE Advanced Lithography Conference this year for personal reasons, but Applied Materials was kind enough to set up a phone briefing for me with Regina Freed to discuss their Materials-Enabled Patterning announcement.

At IEDM Applied Materials (AMAT) tried to put together a panel across the entire… Read More


A Forbidden Pitch Combination at Advanced Lithography Nodes

A Forbidden Pitch Combination at Advanced Lithography Nodes
by Fred Chen on 03-06-2020 at 10:00 am

A Forbidden Pitch Combination at Advanced Lithography Nodes

The current leading edge of advanced lithography nodes (e.g., “7nm” or “1Z nm”) features pitches (center-center distances between lines) in the range of 30-40 nm. Whether EUV (13.5 nm wavelength) or ArF (193 nm wavelength) lithography is used, one thing for certain is that the minimum imaged pitch … Read More


LithoVision – Economics in the 3D Era

LithoVision – Economics in the 3D Era
by Scotten Jones on 03-04-2020 at 6:00 am

Slide3

Each year on the Sunday before the SPIE Advanced Lithography Conference, Nikon holds their LithoVision event. This year I had the privilege of being invited to speak for the third consecutive year, unfortunately, the event had to be canceled due to concerns over the COVID-19 virus but by the time the event was canceled I had already… Read More


Coronavirus Chops SPIE Litho EUV Conference

Coronavirus Chops SPIE Litho EUV Conference
by Robert Maire on 03-01-2020 at 6:00 am

SPIE EUV 2020 Coronavirus

Corona Curtails already quiet SPIE Litho conference
Our best guess is that attendance was off by 30% from last years SPIE conference due to a lack of travelers from many Asian areas obviously out of Corona fear. Even Intel, which is a few miles away was a virtual no-show with a mass cancellation.

More importantly, virtually all after… Read More


ASML “A Swing to Memory Looms” Nice performance while awaiting Memory bounce

ASML “A Swing to Memory Looms” Nice performance while awaiting Memory bounce
by Robert Maire on 01-24-2020 at 6:00 am

ASML 2020 Logic Memory
  • Good Q4 & 2019 despite weak memory
  • 2020 will be up year but memory an unknown
  • EUV ramp is on track – no China or memory impact
ASML reports an “in line” Q4 despite industry weak 2019

ASML reported sales of 4B Euros and a nice gross margin of 48% resulting in 2.70 Euros per share in earnings.  Orders came in at 2.4B

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IEDM 2019 – Imec Interviews

IEDM 2019 – Imec Interviews
by Scotten Jones on 01-21-2020 at 6:00 am

Slide4

Imec is one of the premier semiconductor research organizations and at IEDM they presented dozens of papers. I had the opportunity to see several of the papers presented and interview 3 of Imec’s researchers.

Jan Van Houdt, DMTS ferroelectric and exploratory memory

I have had very interesting discussions with Imec researchers… Read More


ASML EUV China Chip Equip Risk

ASML EUV China Chip Equip Risk
by Robert Maire on 01-10-2020 at 10:00 am

ASML China EUV
  • Is ASML first clandestine shot in US war on China chips?
  • Will the action extend further to other chip equip cos?
  • China chip cold conflict warming up?

It would appear from a Reuters report yesterday that a behind the scenes “cold war” between the US and China in the chip business has just been exposed and has the potential… Read More


IEDM 2019 – Applied Materials panel EUV Recap

IEDM 2019 – Applied Materials panel EUV Recap
by Scotten Jones on 12-23-2019 at 10:00 am

On Tuesday night of IEDM, Applied Materials held a panel discussion “The Future of Logic: EUV is Here, Now What?”. The panelists were: Regina Freed, managing director at Applied Materials as the moderator, Geoffrey Yeap, senior director of advanced technology at TSMC, Bala Haran, director of silicon process research at IBM, … Read More


ASML – In Line Qtr but big bookings – Logic Strong! Memory ? EUV?

ASML – In Line Qtr but big bookings – Logic Strong! Memory ? EUV?
by Robert Maire on 10-20-2019 at 6:00 am

ASML in line QTR with big Orders
Near term slippage w long term upside
Logic is strong but memory recovery unknown
EUV is finally a reality/commercialized

In line quarter- supplier slippage expected in Q4
Results were revenues of Euro 3B and EPS of Euro 1.49, more or less in line with earnings estimate if a tad bit light in revenue. … Read More