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SEMICON West 2019 – Day 1 – Imec

SEMICON West 2019 – Day 1 – Imec
by Scotten Jones on 07-15-2019 at 10:00 am

On Monday, July 8th Imec held a technology forum ahead of Semicon West. I saw the papers presented and interviewed three of the authors. The following is a summary of what I feel are the keys points of their research.

Arnaud Furnemont
Arnaud Furnemont’s talk was titled “From Technology Scaling to System Optimization”. Simple 2D … Read More


SPIE Advanced Lithography Conference – Imec design papers

SPIE Advanced Lithography Conference – Imec design papers
by Scotten Jones on 06-27-2019 at 10:00 am

At the SPIE Advanced Lithography Conference Imec presented several design papers and I have had the opportunity to review the papers and speak with the authors. In this summary I am going to address three emerging areas in order of when I think they may be implemented from soonest to latest.

Specifically, I will discuss:

  1. Buried Power
Read More

SPIE Advanced Lithography Conference – Imec and Veeco on EUV

SPIE Advanced Lithography Conference – Imec and Veeco on EUV
by Scotten Jones on 04-19-2019 at 12:00 pm

At the SPIE Advanced Lithography Conference Imec presented several papers on EUV and Veeco presented about etching for EUV masks. I had the opportunity to see the presentations and speak with some of the authors. In this article I will summarize the key issues around EUV based on this research.

EUV is ramping up into high volume 7nm… Read More


SPIE Advanced Lithography Conference 2019 Overall Impressions

SPIE Advanced Lithography Conference 2019 Overall Impressions
by Scotten Jones on 03-05-2019 at 6:00 am

Last week I attended the 2019 SPIE Advanced Lithography Conference. I gave two presentations, attended dozens of papers and conducted three interviews. I will be doing some detailed write ups particularly on EUV but I am waiting for the presentations from several of the papers. In the mean time I thought I would put some overall … Read More


LithoVision 2019 – Semiconductor Technology Trends and their impact on Lithography

LithoVision 2019 – Semiconductor Technology Trends and their impact on Lithography
by Scotten Jones on 03-01-2019 at 12:00 pm

I was asked to present at Nikon’s LithoVision event again this year. LithoVision is held the day before the SPIE Advanced Lithography Conference also in San Jose. The following is a write up of my talk.… Read More


Report from SPIE EUV Update 2019

Report from SPIE EUV Update 2019
by Robert Maire on 03-01-2019 at 7:00 am

Not as much new – No breakthrough announcements, 300 watts is better than 250 watts – Pellicle Problems, TSMC is EUV king – Third times a charm? We attended this years SPIE Lithography convention in San Jose as we have for many years. Although the show was quite enthusiastic and EUV was the central topic, as it has… Read More


2018 Semiconductor Year in Review

2018 Semiconductor Year in Review
by Scotten Jones on 01-04-2019 at 12:00 pm

Strong Overall Market Growth but a Slowdown Looms
After six years of single digit percentage growth in the overall semiconductor market, 2017 saw almost 22% growth and 2018 year-to-date is up roughly 17% (based on numbers published by the world semiconductor trade statistics). The big growth driver the last two years has been … Read More


IEDM 2018 Imec on Interconnect Metals Beyond Copper

IEDM 2018 Imec on Interconnect Metals Beyond Copper
by Scotten Jones on 12-28-2018 at 7:00 am

At IEDM this December Imec presented “Interconnect metals beyond copper – reliability challenges and opportunities”. In addition to seeing the paper presented I had a chance to interview one of the authors, Kristof Croes. Replacements for copper are a hot subject and I will summarize the challenges and Imec’s work.… Read More


IEDM 2018 – ASML EUV Update

IEDM 2018 – ASML EUV Update
by Scotten Jones on 12-11-2018 at 7:00 am

At IEDM last week Anthony (Tony) Yen, Vice President and Head, Technology Development Centers Worldwide for ASML presented a paper entitled “EUV Lithography at Threshold of High-Volume Manufacturing” authored by Anthony Yen, Hans Meiling, and Jos Benschop. At IEDM I had a chance to sit down with Tony and discuss the paper and … Read More


SEMICON West – Leading Edge Lithography and EUV

SEMICON West – Leading Edge Lithography and EUV
by Scotten Jones on 08-13-2018 at 7:00 am

At SEMICON West I attended the imec technology forum, multiple Tech Spot presentations and conducted a number of interviews relevant to advanced lithography and EUV. In this article I will summarize what I learned plus make some comments on the outlook for EUV.… Read More