SEMICON Day 3: Leti, Intel Keynote, 450mm (Pic!) and Innovation Keynote

SEMICON Day 3: Leti, Intel Keynote, 450mm (Pic!) and Innovation Keynote
by Paul McLellan on 07-15-2015 at 11:59 am

Let’s start with yesterday evening, so technically yesterday. It was July 14th, which is the equivalent of Independence Day in France. So the perfect day for Leti, based in Grenoble, to present a lot of the work that they are doing on 3D “more than Moore” type technologies, including photonics. Also, wafer-scale… Read More


GlobalFoundries Endorse ST/LETI FD-SOI 22nm!

GlobalFoundries Endorse ST/LETI FD-SOI 22nm!
by Eric Esteve on 07-03-2015 at 9:00 am

The LETI days and the associated FD-SOI workshop took place in Grenoble (France) last week and I could not attend in person… but I had the opportunity to speak with LETI CEO Marie Semaria. Before going into details into the 3 key messages from the LETI (FD-SOI, Silicon Impulse and Cool Cube), it’s important to share the great news from… Read More


DSP running 10 times faster at ultra-low voltage?

DSP running 10 times faster at ultra-low voltage?
by Eric Esteve on 03-11-2014 at 12:30 pm

The LETI and STMicro have demonstrated a DSP that can hit 500 MHz while pulling just 460mV – that’s ten times better than anything the industry’s seen so far. Implemented on a 28nm FD-SOI technology, with ultra thin forward body biasing (UTFBB) capability (used to decrease Vth), this DSP can also be exercised at higher voltage when… Read More


Why SOI is the Future Technology of Semiconductor

Why SOI is the Future Technology of Semiconductor
by Eric Esteve on 01-14-2014 at 8:34 am

No doubt that FDSOI generate high interest these days and I found a very interesting contribution from Zvi Or-Bach, President and CEO of MonolithIC 3D, Inc. Zvi has accepted to share his wrap-up from IEDM, in a blog for Semiwiki readers. If you remember the long discussion we had in Semiwiki about cost comparison, some comments were… Read More


Direct Write E-beam

Direct Write E-beam
by Paul McLellan on 07-13-2012 at 2:08 pm

One of the presenters at the standing-room only litho session at Semicon this week was Serge Tedesco, the litho program manager at CEA-Leti in Grenoble France. He is running a program called IMAGINE for maskless lithography. Chips today are built using a reticle (containing the pattern for that layer of the chip) which is exposed… Read More