IMEC-Horizontal Nanowires for 5nm at the VLSI Technology Symposium

IMEC-Horizontal Nanowires for 5nm at the VLSI Technology Symposium
by Scotten Jones on 07-21-2016 at 12:00 pm

At the VLSI Technology Symposium, IMEC presented a paper entitled “Gate-All-Around MOSFETs based on Vertically Stacked Horizontal Si Nanowires in a Replacement Metal Gate Process on Bulk Silicon Wafers”. I have wanted to blog about this paper since the symposium was held but also wanted to tie it in with an interview… Read More


IC Designers talk about 28nm to 7nm challenges at #53DAC

IC Designers talk about 28nm to 7nm challenges at #53DAC
by Daniel Payne on 06-20-2016 at 12:00 pm

IC design challenges are different at advanced nodes like 7nm, so to learn more about the topic I attended a panel luncheon at DAC sponsored by Cadence. The moderator was both funny and technically astute, quite the rare combination, so kudos to Professor Rob Rutenbar, a former Neolinear guy now at the University of Illinois. Panelists… Read More


IMEC Technology Forum (ITF) – Secrets of Semiconductor Scaling

IMEC Technology Forum (ITF) – Secrets of Semiconductor Scaling
by Scotten Jones on 06-07-2016 at 4:00 pm

IMEC is a technology research center located in Belgium that is one of the premier semiconductor research centers in the world today. The IMEC Technology Forum (ITF) is a two-day event attended by approximately 1,000 people to showcase the work done by IMEC and their partners.… Read More


IMEC Technology Forum (ITF) – Moving the Electronics Industry Forward

IMEC Technology Forum (ITF) – Moving the Electronics Industry Forward
by Scotten Jones on 06-02-2016 at 4:00 pm

IMEC is a technology research center located in Belgium that is one of the premier semiconductor research centers in the world today. The IMEC Technology Forum (ITF) is a two-day event attended by approximately 1,000 people to showcase the work done by IMEC and their partners.

Gary Patton is the Chief Technical Officer and Senior… Read More


IMEC Technology Forum (ITF) – EUV When, Not If

IMEC Technology Forum (ITF) – EUV When, Not If
by Scotten Jones on 05-28-2016 at 7:00 am

For me personally EUV has been something of a roller coaster ride over the last several years. I started out a strong believer in EUV but then at the SPIE Advanced Lithography Conference in 2014 TSMC gave a very negative assessment of EUV, and there was a SEMATECH paper on high NA EUV that struck me as extremely unlikely to succeed. I … Read More


Are Standard Cell Libs, Memories and Mixed-signal IP Availabe at 7nm FF?

Are Standard Cell Libs, Memories and Mixed-signal IP Availabe at 7nm FF?
by Eric Esteve on 05-05-2016 at 7:00 am

More than 500 designers (562) have responded to a survey made in 2015 by Synopsys. Answering to the question “What is the fastest clock speed of your design?” 56% have mentioned a clock higher than 500 MHz (and still 40% higher than 1 GHz). If you compare with the results obtained 10 years ago, the largest proportion of answers was for… Read More


EUV is coming but will we need it?

EUV is coming but will we need it?
by Scotten Jones on 04-12-2016 at 4:00 pm

I have written multiple articles about this year’s SPIE Advanced Lithography Conference describing all of the progress EUV has made in the last year. Source power is improving, photoresists are getting faster, prototype pellicles are in testing, multiple sites around the world are exposing wafers by the thousands and more. Read More


10nm SRAM Projections – Who will lead

10nm SRAM Projections – Who will lead
by Scotten Jones on 03-25-2016 at 12:00 pm

At ISSCC this year Samsung published a paper entitled “A 10nm FinFET 128Mb SRAM with Assist Adjustment System for Power, Performance, and Area Optimization. In the paper Samsung disclosed a high density 6T SRAM cell size of 0.040µm[SUP]2[/SUP]. I thought it would be interesting to take a look at how this cell size stacks … Read More