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Lithography Technical Forum

April 28

AngeliqueRaley
Please join us for our SPIE 2022 Virtual Technical Forum to learn the latest on Synopsys Manufacturing’s mask synthesis, mask data prep and lithography simulation solutions. The Tech Forum is peer-to-peer, giving you the opportunity to hear how your lithography colleagues have addressed the challenges of 3nm and beyond.

Speakers/Agenda
6:00pm-6:30pm – Welcome & Introduction: How Much Stochastic Variation Can A Device Tolerate? Enabling reliable electrical performance in an EUV process environment
Larry Melvin
Larry Melvin
Principal Engineer
Synopsys
6:30pm-7:00pm – Latest progress on EUV Patterning: A Holistic Approach to Address Upcoming Challenges 
Angélique Raley
Angélique Raley
Director Product BU
Tokyo Electron
7:00pm-7:30pm – Lithography and OPC Challenges in Advanced Memory Nodes
Ezequiel Vidal Russel
Ezequiel Vidal Russel
Senior Director of Mask Technology
Micron Technology, Inc.
7:30pm-8:00pm: Curvilinear Mask Writing with MBM-2000
Noriaki Nakayamada
Noriaki Nakayamada
Senior Technology Expert
NuFlare

 

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