In early September of 2016 I published an article “The 2016 Leading Edge Semiconductor Landscape” that proved to be very popular with many views, comments and reposting’s. Since I wrote that article a lot of new data has become available enabling some projections to be replaced by actual values and new analysis… Read More
Author: Scotten Jones
The 2017 Leading Edge Semiconductor Landscape
IEDM 2016 – Marie Semeria LETI Interview
Marie Semeria is the CEO of Leti, one of the world’s premier research organization for semiconductor technology and the key development center for FDSOI. I first interviewed Marie at SEMICON West and at IEDM I had a chance to sit down with her and get an update on Leti’s efforts over the last several months.
My interview… Read More
IEDM 2016 – 7nm Shootout
In the first session of IEDM on Monday, December 5th there were two papers presented on 7nm processes. The first paper was from TSMC and the second paper was from the Global Alliance of GLOBALFOUNDRIES, IBM and Samsung.… Read More
IEDM 2016 – GLOBALFOUNDRIES 22FDX Update
At IEDM in 2015 I had a chance to sit down with Subramani (Subi) Kengeri and get a briefing on GLOBALFOUNDRIES 22FDX technology. At IEDM 2016 Rick Carter of GLOBALFOUNDRIES presented a paper on 22FDX. Following Rick’s presentation, I had a chance to sit down with Rick and John Pellerin, VP of Technology and Integration and … Read More
Advanced Semiconductor Process Cost Trends
The cost trend for leading edge semiconductor technologies is a subject of some controversy in the industry. Cost is a complex issue with many interacting factors and much of the information out in the industry is in my opinion misleading or incorrect. In this article, I will discuss each of the factors as well as present a view of … Read More
Soitec – Enabling the FDSOI Revolution
Recently I published two blogs on Fully Depleted Silicon On Insulator (FDSOI) and the potential the technology shows for a variety of low power and wireless applications. In order to produce FDSOI devices, the device layer has to be thin enough to ensure the device is fully depleted and ideally the buried oxide has to be thin enough… Read More
The Status and Future of FDSOI
I recently took a look at the current status and future direction of FinFET based logic processes in my Leading Edge Logic Landscape blog. I thought it would be interesting to take a similar look at FDSOI and to compare and contrast the two processes. My Leading Edge Logic Landscape blog is available here.… Read More
GLOBALFOUNDRIES Extends the FDSOI Roadmap
On September 8, 2016 GLOBALFOUNDRIES (GF) announced their 12nm FDSOI technology node. On September 12th I had a chance to interview Greg Bartlett, GF Senior Vice President for the CMOS Business Unit (as a side note, GF has: RF SOI, ASIC and CMOS business units).… Read More
The 2016 Leading Edge Semiconductor Landscape
The leading edge semiconductor logic landscape has in recent years collapsed to just four companies. The following is a summary of what is currently known about each company’s plans and how they compare. ASML has analyzed many logic nodes and developed a formula that normalizes processes to a “standard node”.… Read More
SEMICON West – Globalfoundries Update
On Wednesday of SEMICON West I got to sit down with Gary Patton, CTO of GlobalFoundries and get an update on what has been going on with them.
Gary started the interview by pointing out that it has now been a year since the GlobalFoundries purchase of many of IBM’s semiconductor assets and they have hit every commitment they made.… Read More
Weebit Nano Brings ReRAM Benefits to the Automotive Market