All Things Semiconductor!
On Wednesday, July 10th I got to sit down with Gary Patton, CTO and SVP of worldwide research and development of Global Foundries and get an update on how the company is doing.
We started with a discussion of Global Foundries (GF) general business health. Revenue for the year is expected to be around $6 billion dollars. They are focused… Read More
Tuesday July 9th was the first day the show floor was open at Semicon. The following is a summary of some announcements I attended and general observations.
AMAT Announcement
My day started with an Applied Materials (AMAT) briefing for press and analysts where they announced “the most sophisticated system they have ever released… Read More
On Monday, July 8th Imec held a technology forum ahead of Semicon West. I saw the papers presented and interviewed three of the authors. The following is a summary of what I feel are the keys points of their research.
Arnaud Furnemont
Arnaud Furnemont’s talk was titled “From Technology Scaling to System Optimization”. Simple 2D … Read More
At the SPIE Advanced Lithography Conference Imec presented several design papers and I have had the opportunity to review the papers and speak with the authors. In this summary I am going to address three emerging areas in order of when I think they may be implemented from soonest to latest.
Specifically, I will discuss:
Samsung and TSMC have both made recent disclosures about their 5nm process and I though it would be a good time to look at what we know about them and compare the two processes.
A lot of what has been announced about 5nm is in comparison to 7nm so we will first review 7nm.
7nm
Figure 1 compares Samsung’s 7LPP process to TSMC’s 7FF and 7FFP… Read More
At the SPIE Advanced Lithography Conference Imec presented several papers on EUV and Veeco presented about etching for EUV masks. I had the opportunity to see the presentations and speak with some of the authors. In this article I will summarize the key issues around EUV based on this research.
EUV is ramping up into high volume 7nm… Read More
At the SPIE Advanced Lithography Conference ASML gave an update on both the current 0.33NA system and the 0.55 high-NA system development. I saw the presentations and got to sit down with Mike Lercel (Director of Strategic Marketing).… Read More
Last week I attended the 2019 SPIE Advanced Lithography Conference. I gave two presentations, attended dozens of papers and conducted three interviews. I will be doing some detailed write ups particularly on EUV but I am waiting for the presentations from several of the papers. In the mean time I thought I would put some overall … Read More
I was asked to present at Nikon’s LithoVision event again this year. LithoVision is held the day before the SPIE Advanced Lithography Conference also in San Jose. The following is a write up of my talk.… Read More
Strong Overall Market Growth but a Slowdown Looms
After six years of single digit percentage growth in the overall semiconductor market, 2017 saw almost 22% growth and 2018 year-to-date is up roughly 17% (based on numbers published by the world semiconductor trade statistics). The big growth driver the last two years has been … Read More
eFPGA – “What a great idea! But I have no idea how I’d use it!”
Ensuring System-level Security Through Hardware/Software Security Verification
REPLAY: Fabless: The Transformation of the Semiconductor Industry
The Brave New World of Customized Memory
Embedded FPGA: The Fabric for Optimized Machine Learning
VLSI Design Methodology Development
Desinging Complex SoCs and Dealing with Multiple File Formats?
How ASIC/SoC Prototyping Solutions Can Help You!
Flexible, Multiprotocol IO’s in 7nm FinFets
REPLAY: GPU-Powered SPICE: The Way Forward for Analog Simulation
