My Top Three Reasons to Attend IEDM 2019

My Top Three Reasons to Attend IEDM 2019
by Scotten Jones on 10-11-2019 at 6:10 am

Image RemovedThe International Electron Devices Meeting is a premier event to learn about the latest in semiconductor process technology. Held every year in early December is San Francisco this years conference will be held  from Decembers 7th through December 11th. You can learn more about the conference at their web site hereRead More


IEDM 2019 to Highlight Innovative Devices for an Era of Connected Intelligence

IEDM 2019 to Highlight Innovative Devices for an Era of Connected Intelligence
by Scotten Jones on 08-28-2019 at 6:00 am

Image RemovedThe IEEE International Electron Devices Meeting is in my opinion the leading technology conference to understand the current state-of-the-art in semiconductor process technology. Held each year in early December in San Francisco it is a must attend conference for anyone following technology development. The… Read More


Semicon West 2019 – Day 4 – Soitec

Semicon West 2019 – Day 4 – Soitec
by Scotten Jones on 08-21-2019 at 6:00 am

Image RemovedLast year at Semicon I sat down with Soitec and got an update on the company. You can read my write up from last year here. A key point last year was Soitec was continuing to be profitable and grow after several years of financial struggles.

On Thursday, July 11th I got to sit down with Soitec’s CEO, Paul Boudre and … Read More


Semicon West 2019 – Day 3 – Global Foundries

Semicon West 2019 – Day 3 – Global Foundries
by Scotten Jones on 07-30-2019 at 10:00 am

On Wednesday, July 10th I got to sit down with Gary Patton, CTO and SVP of worldwide research and development of Global Foundries and get an update on how the company is doing.

We started with a discussion of Global Foundries (GF) general business health. Revenue for the year is expected to be around $6 billion dollars. They are focused… Read More


Semicon West 2019 – Day 2

Semicon West 2019 – Day 2
by Scotten Jones on 07-18-2019 at 10:00 am

Tuesday July 9th was the first day the show floor was open at Semicon. The following is a summary of some announcements I attended and general observations.

AMAT Announcement

My day started with an Applied Materials (AMAT) briefing for press and analysts where they announced “the most sophisticated system they have ever released… Read More


SEMICON West 2019 – Day 1 – Imec

SEMICON West 2019 – Day 1 – Imec
by Scotten Jones on 07-15-2019 at 10:00 am

On Monday, July 8th Imec held a technology forum ahead of Semicon West. I saw the papers presented and interviewed three of the authors. The following is a summary of what I feel are the keys points of their research.

Arnaud Furnemont
Arnaud Furnemont’s talk was titled “From Technology Scaling to System Optimization”. Simple 2D … Read More


SPIE Advanced Lithography Conference – Imec design papers

SPIE Advanced Lithography Conference – Imec design papers
by Scotten Jones on 06-27-2019 at 10:00 am

At the SPIE Advanced Lithography Conference Imec presented several design papers and I have had the opportunity to review the papers and speak with the authors. In this summary I am going to address three emerging areas in order of when I think they may be implemented from soonest to latest.

Specifically, I will discuss:

  1. Buried Power
Read More

TSMC and Samsung 5nm Comparison

TSMC and Samsung 5nm Comparison
by Scotten Jones on 05-03-2019 at 7:00 am

Samsung and TSMC have both made recent disclosures about their 5nm process and I though it would be a good time to look at what we know about them and compare the two processes.

A lot of what has been announced about 5nm is in comparison to 7nm so we will first review 7nm.

7nm
Figure 1 compares Samsung’s 7LPP process to TSMC’s 7FF and 7FFP… Read More


SPIE Advanced Lithography Conference – Imec and Veeco on EUV

SPIE Advanced Lithography Conference – Imec and Veeco on EUV
by Scotten Jones on 04-19-2019 at 12:00 pm

At the SPIE Advanced Lithography Conference Imec presented several papers on EUV and Veeco presented about etching for EUV masks. I had the opportunity to see the presentations and speak with some of the authors. In this article I will summarize the key issues around EUV based on this research.

EUV is ramping up into high volume 7nm… Read More


SPIE Advanced Lithography Conference – ASML EUV Update

SPIE Advanced Lithography Conference – ASML EUV Update
by Scotten Jones on 03-23-2019 at 12:00 am

At the SPIE Advanced Lithography Conference ASML gave an update on both the current 0.33NA system and the 0.55 high-NA system development. I saw the presentations and got to sit down with Mike Lercel (Director of Strategic Marketing).… Read More