Intro
Neal Carney, VP of Marketing at Tela Innovations provided me an update at DAC last week. Their company partnered with TSMC to reduce leakage in IC designs by biasing the gate lengths on your paths that are non-critical to timing.
Notes
Why do this?
– Reduce leakage
– Increase gate lengths on paths with slack
–… Read More
Facing the Quantum Nature of EUV Lithography