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Taming the Challenges of Advanced Node Digital Designs November 10, 2021 Overview Although new challenges arise with each node, the move from bulk technologies to advanced node technologies marks a distinctive shift in complexity. Some of the important factors to consider are new devices, challenging and competing design rules, double patterning, managing of the layout …
27 February - 3 March 2022 San Jose, California, United States The conference for emerging technology in the semiconductor industry A conference program has been built with all the great content you expect at SPIE Advanced Lithography + Patterning Prepare to join other leading researchers who are solving challenges in optical and EUV lithography, patterning …
Wednesday, September 21 | 2 pm EDT (New York) | 1 pm CDT (Chicago) | 11 am PDT (San Francisco) Altair SimLab is a powerful platform that provides top-of-the-line tools for meshing and preparing CAD models for CFD analysis. In this webinar, we will present the workflow for CAD cleanup and solver-neutral CFD setups, such …
San Jose Convention Center
150 W San Carlos St, San Jose, CA, United States
The event for emerging technology in the semiconductor industry Attend and hear research, challenges, and breakthroughs as you gather with colleagues in San Jose Join other leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications. Five days of exciting content and …
