Although new challenges arise with each node, the move from bulk technologies to advanced node technologies marks a distinctive shift in complexity. Some of the important factors to consider are new devices, challenging and competing design rules, double patterning, managing of the layout dependent effects, and accounting for new signoff requirements.

In the first part of this webinar, we will discuss the new challenges that advanced nodes pose, and in the second half, we will present technologies that help to manage these new challenges. This webinar will be very useful to those that have just started in advanced node design or plan to in the near future.

November 10
10:00 GMT / 11:00 CET / 12:00 EET and Israel / 15:30 IST