2021 Call for Papers

Present your research at the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.

A home for your research

As an author, don’t hesitate to submit an abstract. Although much in the world remains uncertain, the one constant is that your work is important. SPIE continues our commitment to providing a forum for information sharing, collaboration, and advancing research that is vital to your community. Prepare your abstract and by doing so you will guarantee that your research is ready to be shared. Find our response to COVID-19 here.

Explore the Call for Papers

Present your research at the premier worldwide technical meeting for photomasks, patterning, metrology, materials, inspection/repair, mask business, extreme UV lithography, and emerging technologies.

Photomask Technology • Design automation and data prep (DFM, OPC, SMO) • Mask write, corrections, process compensation (MPC) • Mask blanks, defects, and metrology (materials, process, control) • Mask process (resist, devlop, etch, cleans) • Metrology (CD, placement, AFM, AIMS) • Defects and defect control: inspection, repair, verification strategies, pellicles, in fab • Simulation and imaging: mask transfer to wafer (LER, SWA, surface roughness) • Nanoimprint lithography tools, mask, transfer, and resists • Deep learning mask technology applications

Extreme Ultraviolet Lithography • EUV readiness and insertion in manufacturing • EUV tools, including sources and optics • EUV mask metrology, inspection, and lifetime • EUV mask and imaging • EUV mask pellicles • EUV resist materials/process and contamination • EUV process control and stochastics • EUV patterning and process enhancement • EUV lithography extendibility