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WP_Term Object
(
[term_id] => 31
[name] => GlobalFoundries
[slug] => globalfoundries
[term_group] => 0
[term_taxonomy_id] => 31
[taxonomy] => category
[description] =>
[parent] => 158
[count] => 240
[filter] => raw
[cat_ID] => 31
[category_count] => 240
[category_description] =>
[cat_name] => GlobalFoundries
[category_nicename] => globalfoundries
[category_parent] => 158
[is_post] =>
)
On Tuesday morning at SEMICON I had the opportunity to sit down with Harry Levinson, Sr. Director of Technology Research and Sr. Fellow at Global Foundries and Michael Lercel, Director of Strategic Marketing at ASML to discuss the state of lithography.
I opened the discussion with a question about how we are going to address lithography… Read More
This is part 2 (of 2) of my coverage of the recent FD-SOI Symposium in San Jose (April 2016), this time looking at the 22nm presentations by GlobalFoundries, ARM (finally!!), VLSI Research Inc and Sigma Designs. (Part 1 looked at the 28nm presentations.) Most are now available on the SOI Consortium website – click here to see the full… Read More
IMEC is a technology research center located in Belgium that is one of the premier semiconductor research centers in the world today. The IMEC Technology Forum (ITF) is a two-day event attended by approximately 1,000 people to showcase the work done by IMEC and their partners.
Gary Patton is the Chief Technical Officer and Senior… Read More
GLOBALFOUNDRIES has been evangelizing their 22FDX FD-SOI process for a few months; readers may have seen Tom Simon’s write-up of their preview at ARM TechCon. Dr. Joerg Winkler recently gave an updated webinar presentation of their approach in an implementation of ARM Cortex-A17 core.
By now, you’ve probably heard that 22FDX… Read More
Who’s doesn’t like a good webinar? I certainly do as it is one of the most time efficient ways to interact with the fabless semiconductor ecosystem, absolutely. Especially when it addresses two of the top trending topics on SemiWiki and they are ARM and FD-SOI. Here is a quick summary of what you will learn:
GLOBALFOUNDRIES… Read More
When I first heard about a foundry possibly licensing FD-SOI I would have bet it was SMIC in China. What better market for a low cost, low power, easy to manufacture alternative to FinFETs? The foundry of course was Samsung which also made complete sense since they have 28nm gate-first capacity that matches up nicely to 28nm FD-SOI.… Read More
I have written multiple articles about this year’s SPIE Advanced Lithography Conference describing all of the progress EUV has made in the last year. Source power is improving, photoresists are getting faster, prototype pellicles are in testing, multiple sites around the world are exposing wafers by the thousands and more. … Read More
If you’re in the chip biz in Silicon Valley, check out the SOI Consortium FD-SOI Symposium on April 13th in San Jose. They’ve been running these things since 2009, and I have to say that this one is the most comprehensive to date. Headliners include Cisco, Sony, NXP, SigmaDesigns, ARM, Ciena plus the big FD-SOI foundries,… Read More
SPIE is next week so if you would like to meet me in person that is where I will be. SPIE is the big lithography and patterning conference for semiconductor professionals. Since I work with the foundries during my day job, SPIE is an important conference. SemiWiki blogger Scott Jones will also be there. During the day Scott does semiconductor… Read More
A little over a month into 2016 and we already have a raft of FD-SOI news from Samsung, GlobalFoundries, NXP/Freescale, Renesas and more. Quite a bit of it came out of the recent SOI Consortium forum in Tokyo. Many of the presentations are now available on the SOI Consortium website (click here to see what’s there) – but keep checking… Read More
Stochastic Pupil Fill in EUV Lithography