In forty plus years as a semiconductor professional I have never seen a semiconductor design ecosystem build as fast and as strong as RISC-V. As a result, RISC-V Now! has emerged as a pivotal gathering, a conference with a clear and ambitious mission: To transform the open, modular, and flexible RISC-V ISA from an exciting specification… Read More
Author: Daniel Nenni
RISC-V Now! — Where Specification Meets Scale!
CEO Interview with Charlie Peppiatt of Gooch & Housego
Charlie Peppiatt has served as Chief Executive Officer of Gooch & Housego since September 2022. He joined the company from TT Electronics, where he was Executive Vice President following TT’s acquisition of Stadium Group plc. Prior to that, Charlie served as Chief Executive Officer of Stadium Group from 2013 until its acquisition… Read More
CEO Interview with Jussi-Pekka Penttinen of Vexlum Ltd
Jussi-Pekka Penttinen is the chief executive officer, chief technical officer, and cofounder of Vexlum Ltd, an advanced laser technology company. With more than 15 years of experience, he is a leading researcher in the field of Vertical External Cavity Surface Emitting Laser (VECSEL) and successfully commercialized the technology.… Read More
Sensors Converge: Where Intelligence Meets the Edge
The Sensors Converge Conference is one of the premier technical gatherings dedicated to the design, integration, and deployment of sensing technologies across industries. The event brings together engineers, system architects, researchers, and product developers to explore advancements in sensor hardware, edge computing,… Read More
CEO Interview with JP Pentinen of Vexlum
Jussi-Pekka Penttinen is the chief executive officer, chief technical officer, and cofounder of Vexlum Ltd, an advanced laser technology company. With more than 15 years of experience, he is a leading researcher in the field of Vertical External Cavity Surface Emitting Laser (VECSEL) and successfully commercialized the technology.… Read More
Silicon Insurance: Why eFPGA is Cheaper Than a Respin — and Why It Matters in the Intel 18A Era
As semiconductor technology advances into increasingly complex and expensive process nodes, the economic and technical risks associated with ASIC design have grown dramatically. At advanced nodes such as Intel 18A, the cost of a single design error can escalate into tens of millions of dollars, compounded by months of delay.… Read More
Chemical Origins of Environmental Modifications to MOR Lithographic Chemistry
In the pursuit of advanced extreme ultraviolet (EUV) lithography for high-NA patterning, metal oxide resists (MORs) offer significant promise but face challenges like critical dimension (CD) variation due to atmospheric interactions. Presented at SPIE Advanced Lithography + Patterning 2025 by Kevin M. Dorney and colleagues… Read More
GTC 2026: Agentic AI for Semiconductor Design and Manufacturing
Beyond Moore’s Law: High NA EUV Lithography Redefines Advanced Chip Manufacturing
The imec installation of the ASML EXE:5200 High Numerical Aperture (High NA) extreme ultraviolet (EUV) lithography system at imec represents a pivotal advancement in semiconductor manufacturing and research. This system, installed in imec’s 300 mm cleanroom in Leuven, Belgium, introduces unprecedented lithographic resolution… Read More
CEO Interview with Moti Margalit of SonicEdge
Moti Margalit is the CEO and co-founder of SonicEdge, a deep-tech pioneer reinventing sound through ultrasonic modulation – unlocking smaller, vibration-free speakers with studio-quality audio.
With a background in lasers and electro-optics, Moti transitioned from technologist to inventor. His career spans 150+ patents… Read More










TSMC Technology Symposium 2026 Overview