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ARC Processor Summit 2022 Your embedded edge starts here!

ARC Processor Summit 2022 Your embedded edge starts here!
by Synopsys on 08-15-2022 at 10:00 am

ARC Summit 2022

As embedded systems continue to become more complex and integrate greater functionality, SoC developers are faced with the challenge of developing more powerful, yet more energy-efficient devices. The processors used in these embedded applications must be efficient to deliver high levels of performance within limited power… Read More


Digital Twins Simplify System Analysis

Digital Twins Simplify System Analysis
by Dave Bursky on 08-15-2022 at 6:00 am

Siemens Digital Twin SemiWiki

The ability to digitally replicate physical systems has been used to model hardware operations for many years, and more recently, digital twining technology has been applied to electronic systems to better simulate and troubleshoot the systems. As explained by Bryan Ramirez, Director of Industries, Solutions & Ecosystems,… Read More


Time for NHTSA to Get Serious

Time for NHTSA to Get Serious
by Roger C. Lanctot on 08-14-2022 at 10:00 am

Time for NHTSA to Get Serious

In the final season of “The Sopranos,” Christopher Multisanti (played by Michael Imperioli) and Anthony Soprano (James Gandolfini) lose control of their black Cadillac Escalade and go tumbling off a two-lane rural highway and down a hill. Christopher dies (spoiler alert) with an assist from Tony, before Tony calls “911” for… Read More


Spot Pairs for Measurement of Secondary Electron Blur in EUV and E-beam Resists

Spot Pairs for Measurement of Secondary Electron Blur in EUV and E-beam Resists
by Fred Chen on 08-14-2022 at 8:00 am

Spot Pairs for Measurement of Secondary Electron Blur in EUV

There is growing awareness that EUV lithography is actually an imaging technique that heavily depends on the distribution of secondary electrons in the resist layer [1-5]. The stochastic aspects should be traced not only to the discrete number of photons absorbed but also the electrons that are subsequently released. The electron… Read More


What is Your Ground Truth?

What is Your Ground Truth?
by Roger C. Lanctot on 08-14-2022 at 6:00 am

What is Your Ground Truth

When my son bought a 2020 Chevrolet Bolt EV a couple of years ago, I was excited. I wanted to see what the Xevo-supplied Marketplace (contextually driven ads and offers) looked like and I was also curious as to what clever navigation integration GM was offering.

I was swiftly disappointed to discover that Xevo Marketplace was not… Read More


Podcast EP100: A Look Back and a Look Ahead with Dan and Mike

Podcast EP100: A Look Back and a Look Ahead with Dan and Mike
by Daniel Nenni on 08-12-2022 at 10:00 am

Dan and Mike get together to reflect on the past and the future in this 100th Semiconductor Insiders podcast episode. The chip shortage, foundry landscape, Moore’s law, CHIPS Act and industry revenue trends are some of the topics discussed.

The views, thoughts, and opinions expressed in these podcasts belong solely to … Read More


CEO Interview: Kai Beckmann, Member of the Executive Board at Merck KGaA

CEO Interview: Kai Beckmann, Member of the Executive Board at Merck KGaA
by Daniel Nenni on 08-12-2022 at 6:00 am

Kai Beckmann 1

Kai Beckmann is a Member of the Executive Board at Merck KGaA, Darmstadt, Germany, and the CEO of Electronics. He is responsible for the Electronics business sector, which he has been leading since September 2017. In October 2018, Kai Beckmann also took over the responsibility for the Darmstadt site and In-house Consulting. In… Read More


Understanding Sheath Behavior Key to Plasma Etch

Understanding Sheath Behavior Key to Plasma Etch
by Scott Kruger on 08-11-2022 at 10:00 am

Final Edit EtchingProcess Illustration

Readers of SemiWiki will be well aware of the challenges the industry has faced in photolithography in moving to new nodes, which drove the development of new EUV light sources as well as new masking techniques.  Plasma etching is another key step in chip manufacturing that has also seen new challenges in the development of new sub-10nm… Read More


WEBINAR: Design and Verify State-of-the-Art RFICs using Synopsys / Ansys Custom Design Flow

WEBINAR: Design and Verify State-of-the-Art RFICs using Synopsys / Ansys Custom Design Flow
by Synopsys on 08-11-2022 at 8:00 am

Synopsys Ansys RF Flow Webinar

The design and characterization of RF circuits is a complex process that requires an RF designer to overcome a variety of challenges. Not only do they face the complexities posed by advanced semiconductor processes and the need to meet the demanding requirements of modern wireless standards, designers must also account for electromagnetic… Read More


Flex Logix Partners With Intrinsic ID To Secure eFPGA Platform

Flex Logix Partners With Intrinsic ID To Secure eFPGA Platform
by Kalar Rajendiran on 08-11-2022 at 6:00 am

SoC Block Diagram with EFLX and QuiddiKey

While the ASIC market has always had its advantages over alternate solutions, it has faced boom and bust cycles typically driven by high NRE development costs and time to market lead times. During the same time, the FPGA market has been consistently bringing out more and more advanced products with each new generation. With very… Read More