Wally Rhines DvCon 2011 Ketnote: From Volume to Velocity

Wally Rhines DvCon 2011 Ketnote: From Volume to Velocity
by Daniel Nenni on 02-23-2011 at 1:49 pm

Abstract:
There has been a remarkable acceleration in the adoption of advanced verification methodologies, languages and new standards. This is true across all types of IC design and geographic regions. Designers and verification engineers are surprisingly open to new approaches to keep pace with the relentless rise in design… Read More


Synopsys at Goldman Sachs Technology Conference

Synopsys at Goldman Sachs Technology Conference
by Paul McLellan on 02-21-2011 at 7:00 pm

Aart de Geus was interviewed at the Goldman Sachs Technology Conference last week. Here is some of what he said. Strong Q1, good Q2 outlook, on-track for 2011 guidance. Strong rebound in Far East, Europe mixed, North America good. 80% revenue for year booked by start of year, 90% revenue for a quarter already booked at start of quarter.… Read More


Mentor Graphics Should Be Acquired or Sold: Carl Icahn COUNTERPOINT

Mentor Graphics Should Be Acquired or Sold: Carl Icahn COUNTERPOINT
by Daniel Nenni on 02-20-2011 at 7:04 pm


Daniel,

On Jan 20th, you criticized that the EDA models are all broken and need to change. Ridiculing Synpsys, Cadence, Mentor and Magma for not agreeing to ‘pay for success’ type of model (some form of royalties).

On Feb 14th, you state thatIcahn doesn’t understand EDA and should stay out. Maybe he is seeing … Read More


Mentor Graphics to Participate in SemiWiki.com Social Media Platform

Mentor Graphics to Participate in SemiWiki.com Social Media Platform
by admin on 02-17-2011 at 8:16 am


San Jose, Calif., [DATE], 2011 – SemiWiki.com today announced that Mentor Graphics, a world leader in electronic hardware and software design solutions, will participate in the SemiWiki.com global social media platform aimed at facilitating mass communication for electronic design professionals through Web 2.0 technologies.… Read More


The Looming IP Explosion

The Looming IP Explosion
by Steve Moran on 02-15-2011 at 10:58 am

There has been a lot of talk about the fluid role of IP in semiconductor design. With the Synopsys acquisition of Virage Logic the playing field has tilted substantially in favor of Synopsys… or maybe not!

At first glance this acquisition appears to be a huge threat to EDA and IP companies allowing Synopsys to “throw in” IP asRead More


New ERC Tools Catch Design Errors

New ERC Tools Catch Design Errors
by glforte on 02-11-2011 at 2:18 pm

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A growing number of reports highlight a class of design errors that is difficult to check using more traditional methods, and can potentially affect a wide range of IC designs, especially where high reliability is a must.By Matthew Hogan

Today’s IC designs are complex. They contain vast arrays of features and functionality in Read More


EDA and Wall Street

EDA and Wall Street
by Paul McLellan on 02-11-2011 at 1:25 pm

Good news in a way: Merrill Lynch (or Bank of America Merrill Lynch as I suppose we have to get used to calling them) have re-started coverage of EDA with a 20 page report on the industry, much of which is spent on explaining how the industry segments out and who is strong in which segments, stuff that most people reading this site already… Read More


DRC+, DFM, CMP, Variablility

DRC+, DFM, CMP, Variablility
by Daniel Payne on 02-10-2011 at 12:42 pm

When I worked at Intel as a circuit design engineer I could talk directly with the technology development engineers to understand how to really push my DRAM designs and get the smallest possible memory cell layout that would still yield well, provide fast access time, and long refresh cycles.

(United States Patent 6661699. Inventor:… Read More


Keynote Address at the 16th Asia and South Pacific Design Automation Conference

Keynote Address at the 16th Asia and South Pacific Design Automation Conference
by Daniel Nenni on 02-06-2011 at 6:23 pm

"Managing increasing complexity through higher-level of abstraction: What the past has taught us about the future" Dr. Ajoy Bose, Atrenta CEO

Here is the abstract:
Time to market and design complexity challenges are well-known; we have all seen the statistics and predictions. A well-defined strategy to address Read More


iPDK is the way to go for AMS designs

iPDK is the way to go for AMS designs
by Daniel Payne on 01-19-2011 at 3:47 pm

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I just read the press release from TowerJazz and Tanner EDA about how an AMS designer can use schematic symbols and layout generators in Tanner EDA tools for the TowerJazz 0.18um node. This is made possible because of the growing iPDK (Interoperable Process Design Kits) movement.

In the old days each foundry would have to staff up… Read More