Mark Ren has 26 years of EDA and AI R&D experience spanning IBM Research and NVIDIA Research, driving design automation innovations that power modern chip design. He received the IBM Corporate Award for contributions to the design closure for high-performance microprocessors. At NVIDIA, he helped establish the company
Tag: eda
From Detection to Safety: Reframing Fault Simulation for Functional Safety
In the early 1980s, when computer-aided engineering (CAE), the precursor to modern electronic design automation (EDA), was just taking shape, my professional trajectory shifted in a way that would prove foundational. I joined Teradyne, the Boston-based leader in automated test equipment (ATE), and I encountered for the first… Read More
Webinar: How to burst your workload to Google Cloud, without leaving your data stranded
Google Cloud offers powerful compute, networking and GPU/TPUs to run your workloads. But how to feed the beast? EDA workloads require a lot of data and scalable storage plays is that data hub which keeps your workloads going. Google worked with NetApp – a premier on-premises choice for EDA shared storage – to build … Read More
Webinar: Defacto is Boosting Front-end SoC Design With AI-Powered EDA tools
**Please register with professional email address**
As SoC design complexity grows and design windows shrink, EDA tools must evolve beyond traditional workflows. AI is the catalyst!
This webinar explores what the next generation of EDA tools and design platforms should look like when built with AI in the middle. We’ll… Read More
Webinar: Defacto is Boosting Front-end SoC Design With AI-Powered EDA tools
**Please register with professional email address**
As SoC design complexity grows and design windows shrink, EDA tools must evolve beyond traditional workflows. AI is the catalyst!
This webinar explores what the next generation of EDA tools and design platforms should look like when built with AI in the middle. We’ll… Read More
GPU-native mask rule checking eliminates the curvilinear mask rule check bottleneck
As semiconductor manufacturing pushes toward advanced nodes with tighter feature sizes, the optical proximity correction (OPC) workflow is adopting curvilinear masks to achieve the larger process windows that traditional Manhattan geometries cannot deliver.
Traditional Manhattan masks constrain shapes to vertical … Read More
John Barr: The EDA Veteran and Award-Winning Needham Funds Portfolio Manager
John Barr, Portfolio Manager of the top-ranked Needham Aggressive Growth Fund, has built a career with skills honed not just on Wall Street, but in the trenches of the early EDA industry.
Before becoming a respected sell-side analyst and later a buy-side portfolio manager, Barr spent 15 years in the EDA industry, working through… Read More
LucidShape User Group Meeting – North America
About this event
Join us for our annual LucidShape User Group Meeting— This year’s meeting brings together the LucidShape community for a day of insights, innovation, and collaboration. Whether you’re focused on automotive lighting, simulation workflows, or advanced design techniques, you’ll gain practical knowledge
Webinar: ImSym – Imaging System Simulator Discovery Training
About this event
This discovery training introduces ImSym – Imaging System Simulator, an advanced platform for end-to-end imaging system simulation.
ImSym allows engineers to virtually prototype imaging systems by modeling the full image formation pipeline, from scene and optics through the detector and image signal processing.
Webinar: See it Before You Build it with VisionSym
About this event
Join our upcoming webinar to discover how VisionSym transforms CAD models into photorealistic images using LightTools or LucidShape—eliminating the need for physical prototypes.
With GPU-accelerated ray tracing and photometrically accurate simulations, VisionSym enables both design verification
