(Video) Intel receives ASML's First High NA EUV system

[Xebec]

Neat seeing this (briefly) installed inside the Fab and the relative size vs. people prepping the area..

 

[Daniel Nenni]

Is it smaller than an EUV system?

 

[nghanayem]

Nope, alot bigger.

 

[hist78]

Is it smaller than an EUV system?

Without disassembling it, a typical civilian cargo plane won't be tall enough to transport the High NA EUV machine. Unless you use the Airbus Beluga.

 

[NY_Sam2]

EXE:5000 or EXE:5200? The comments under the video show 5200

 

[Barnsley]

Without disassembling it, a typical civilian cargo plane won't be tall enough to transport the High NA EUV machine. Unless you use the Airbus Beluga.

That is a cool plane!

 

[Fred Chen]

EXE:5000 or EXE:5200? The comments under the video show 5200

TWINSCAN EXE:5000

The dual-stage EUV lithography system is the first in a new generation of machines that will provide 8 nm resolution to support advanced Logic and Memory chip production.

www.asml.com

There could be overlap of key components between 5000 and 5200, which Intel already ordered. So the component being installed may be considered part of an eventual 5200. But only EXE:5000 systems are currently available, as pre-production study tools.