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The dual-stage extreme ultraviolet (EUV) lithography system is the first in a new generation of machines that will provide 8 nm resolution to support advanced Logic and Memory chip production.
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There could be overlap of key components between 5000 and 5200, which Intel already ordered. So the component being installed may be considered part of an eventual 5200. But only EXE:5000 systems are currently available, as pre-production study tools.