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This webinar provides a brief overview of a new text, VLSI Design Methodology Development. The content of the book will be reviewed, highlighting topics that have recently influenced SoC design methodology features – e.g., FinFET circuit libraries, multipatterning lithography, layout-dependent effects, electromigration analysis and FIT rate calculations, test pattern compression. Although the text is targeted …
Course Description: The relentless drive in the semiconductor industry for smaller, faster and cheaper integrated circuits has driven the industry to the 10 nm node and ushered in a new era of high-performance three-dimensional transistor structures. The speed, computational power, and enhanced functionality of ICs based on this advanced technology promise to transform both our …
Semiconductor and integrated circuit developments continue to proceed at an incredible pace. For example, today’s microprocessor chips have one thousand times the processing power of those a decade ago. These challenges have been accomplished because of the integrated circuit industry’s ability to track something known as Moore’s Law. Moore’s Law states that an integrated circuit’s …
Semiconductor and integrated circuit developments continue to proceed at an incredible pace. For example, today’s microprocessor chips have one thousand times the processing power of those a decade ago. These challenges have been accomplished because of the integrated circuit industry’s ability to track something known as Moore’s Law. Moore’s Law states that an integrated circuit’s …
Explosive data growth has led to significant power bottlenecks from the data center to the edge. Enter the Renaissance of Computing, featuring purpose-built accelerators that solve these problems, significantly speeding up AI applications such as training and model inferencing in the cloud and at the edge. Utilizing these and re-imagining architectures solves power issues that …
Overview The layout implementation of analog circuits in advanced FinFET technologies is becoming increasingly complex and challenging, with many new design rules to consider, and multi-patterning, density rules, matching, and EM-IR concerns. These challenges can translate to longer layout turnaround times and reduced productivity. This CadenceTECHTALK™ will focus on silicon-proven technologies that improve layout engineering …
When: August 11, 2022 Where: Online Time: 10:00am-10:30am-(PDT) Language: English When employing process simulation to generate a complex device structure, TCAD engineers often face the task of reproducing the exact etch profile that has been observed in semiconductor fabrication. Silvaco Victory Process offers several geometric models to efficiently achieve etch geometries that accurately match microscopy …
When: May 18, 2023 Where: Online Time: 10:00am-10:30am-(PDT) Language: English When employing process simulation to generate a complex device structure, TCAD engineers often face the task of reproducing the exact etch profile that has been observed in semiconductor fabrication. Silvaco Victory Process offers several geometric models to efficiently achieve etch geometries that accurately match microscopy …
