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Taming the Challenges of Advanced Node Digital Designs November 10, 2021 Overview Although new challenges arise with each node, the move from bulk technologies to advanced node technologies marks a distinctive shift in complexity. Some of the important factors to consider are new devices, challenging and competing design rules, double patterning, managing of the layout …
27 February - 3 March 2022 San Jose, California, United States The conference for emerging technology in the semiconductor industry A conference program has been built with all the great content you expect at SPIE Advanced Lithography + Patterning Prepare to join other leading researchers who are solving challenges in optical and EUV lithography, patterning …
Wednesday, September 21 | 2 pm EDT (New York) | 1 pm CDT (Chicago) | 11 am PDT (San Francisco) Altair SimLab is a powerful platform that provides top-of-the-line tools for meshing and preparing CAD models for CFD analysis. In this webinar, we will present the workflow for CAD cleanup and solver-neutral CFD setups, such …
