A Brief History of Synopsys DesignWare ® IP

A Brief History of Synopsys DesignWare ® IP
by Daniel Nenni on 01-11-2013 at 9:00 am

Let’s play word association. I say “EDA”, you immediately think “Synopsys”. I say “IP” and although 15 years ago you may not, today, you think “Synopsys”. For nearly two decades, Synopsys has grown its IP business through both organic development and acquisition, with a clear focus on enabling designers to meet their time-to-market… Read More


The Semiconductor Landscape – II

The Semiconductor Landscape – II
by Pawan Fangaria on 01-01-2013 at 9:15 pm

It has been a year since my article Semiconductor Landscape in Jan 2012 I wanted to look back into the major events over the year and then anticipate what’s in store going forward. What has happened over the year is much more than what I could foresee. Major consolidation in EDA space – Synopsys acquired Magma, SpringSoft, Ciranova,Read More


FinFET Modeling and Extraction at 16-nm

FinFET Modeling and Extraction at 16-nm
by Daniel Payne on 12-18-2012 at 12:05 pm

In 2012 FinFET is one of the most talked about MOS technologies of the year because traditional planar CMOS has slowed down on scaling below the 28nm node. To learn more about FinFET process modeling I attended a Synopsys webinar where Bari Biswas presented for about 42 minutes include a Q&A portion at the end.


Bari Biswas, SynopsysRead More


A Brief History of Synopsys

A Brief History of Synopsys
by Daniel Nenni on 12-12-2012 at 1:00 pm

One of the largest software companies in the world, Synopsys is a market and technology leader in the development and sale of electronic design automation (EDA) tools and semiconductor intellectual property (IP). Synopsys is also a strong supporter of local education through the Synopsys Outreach Foundation. Each year in multiple… Read More


Double Patterning Verification

Double Patterning Verification
by Paul McLellan on 12-10-2012 at 3:03 am

You can’t have failed to notice that 20nm is coming. There are a huge number of things that are different about 20nm from 28nm, but far and away the biggest is the need for double patterning. You probably know what this is by now, but just in case, here is a quick summary.

Lithography is done using 193nm light. Today we use immersion… Read More


Second FPGA to the right, and straight on ‘til it works

Second FPGA to the right, and straight on ‘til it works
by Don Dingee on 11-26-2012 at 6:00 pm

In a fantasy world where there were no coding errors or integration issues, FPGA designs would fly straight through synthesis easily and quickly. Maybe that world does exist somewhere. For the rest of us, who have experienced the agony of running a large FPGA design – again – only to find another error and have to start over, there … Read More


How much SRAM proportion could be integrated in SoC at 20 nm and below?

How much SRAM proportion could be integrated in SoC at 20 nm and below?
by Eric Esteve on 11-20-2012 at 4:45 am

Once upon a time, ASIC designers were integrating memories in their design (using a memory compiler being part of the design tools provided by the ASIC vendor), then they had to make the memory observable, controllable… and start developing the test program for the function, not a very enthusiastic task (“AAAA” and “5555” and other… Read More


Next Generation FPGA Prototyping

Next Generation FPGA Prototyping
by Paul McLellan on 11-12-2012 at 7:00 am

One technology that has quietly gone mainstream in semiconductor design is FPGA prototyping. That is, using an FPGA version of the design to run extensive verification. There are two approaches to doing this. The first way is simply to build an prototype board, buy some FPGAs from Xilinx or Altera and do everything yourself. The… Read More


Simulation: Expert Insights into Modeling Microcontrollers @ Renesas DevCon

Simulation: Expert Insights into Modeling Microcontrollers @ Renesas DevCon
by Holly Stump on 10-25-2012 at 9:03 pm

Simulation: Expert Insights into Modeling Microcontrollers” was the recent panel hot topic at Renesas DevCon2012, featuring Paolo Giustoof GM, Mark Ramseyerof Renesas, Marc Serughettiof Synopsys, Jay Yantchevof ASTC / VWorks, and Simon Davidmannof Imperas.
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TSMC dilemma: Cadence, Mentor or Synopsys?

TSMC dilemma: Cadence, Mentor or Synopsys?
by Eric Esteve on 10-18-2012 at 4:49 am

Looking at the Press Release (PR) flow, it was interesting to see how TSMC has solved a communication dilemma. At first, let’s precise that #1 Silicon foundry has to work with each of the big three EDA companies. As a foundry, you don’t want to lose any customer, and then you support every major design flow. Choosing another strategy… Read More