TSMC and Synopsys hosted a webinar in December on this topic of double patterning and how it impacts the IC extraction flow. The 20nm process node has IC layout geometries so closely spaced that the traditional optical-based lithography cannot be used, instead lower layers like Poly and Metal 1 require a new approach of using two… Read More
Tag: synopsys
Yawn… New EDA Leader Results Are Coming
We will soon start to see the quarterly financial reporting installments of the “Big 3” public EDA companies. I predict they will be as boring as usual. I am not sure if I would want it any differently though.
Back in the 90s there were times when it was truly interesting to wait to see what Cadence, Mentor, or later Synopsys, might announce.… Read More
IP vendors enable SuperSpeed USB IP take off in 2012
SuperSpeed USB has been clearly ranked in the Interface protocols winner list, see this previous post. It could be interesting to dig into this IP market segment, determine in which applications USB 3.0 has been successfully deployed and who are the IP vendors serving this market, enabling SuperSpeed USB to take off.
SuperSpeed… Read More
A Brief History of Synopsys DesignWare ® IP
Let’s play word association. I say “EDA”, you immediately think “Synopsys”. I say “IP” and although 15 years ago you may not, today, you think “Synopsys”. For nearly two decades, Synopsys has grown its IP business through both organic development and acquisition, with a clear focus on enabling designers to meet their time-to-market… Read More
The Semiconductor Landscape – II
It has been a year since my article Semiconductor Landscape in Jan 2012 I wanted to look back into the major events over the year and then anticipate what’s in store going forward. What has happened over the year is much more than what I could foresee. Major consolidation in EDA space – Synopsys acquired Magma, SpringSoft, Ciranova,… Read More
FinFET Modeling and Extraction at 16-nm
In 2012 FinFET is one of the most talked about MOS technologies of the year because traditional planar CMOS has slowed down on scaling below the 28nm node. To learn more about FinFET process modeling I attended a Synopsys webinar where Bari Biswas presented for about 42 minutes include a Q&A portion at the end.
Bari Biswas, Synopsys… Read More
A Brief History of Synopsys
One of the largest software companies in the world, Synopsys is a market and technology leader in the development and sale of electronic design automation (EDA) tools and semiconductor intellectual property (IP). Synopsys is also a strong supporter of local education through the Synopsys Outreach Foundation. Each year in multiple… Read More
Double Patterning Verification
You can’t have failed to notice that 20nm is coming. There are a huge number of things that are different about 20nm from 28nm, but far and away the biggest is the need for double patterning. You probably know what this is by now, but just in case, here is a quick summary.
Lithography is done using 193nm light. Today we use immersion… Read More
Second FPGA to the right, and straight on ‘til it works
In a fantasy world where there were no coding errors or integration issues, FPGA designs would fly straight through synthesis easily and quickly. Maybe that world does exist somewhere. For the rest of us, who have experienced the agony of running a large FPGA design – again – only to find another error and have to start over, there … Read More
How much SRAM proportion could be integrated in SoC at 20 nm and below?
Once upon a time, ASIC designers were integrating memories in their design (using a memory compiler being part of the design tools provided by the ASIC vendor), then they had to make the memory observable, controllable… and start developing the test program for the function, not a very enthusiastic task (“AAAA” and “5555” and other… Read More