Keysight EDA 2025 Event
WP_Term Object
(
    [term_id] => 19892
    [name] => Tech-X
    [slug] => tech-x
    [term_group] => 0
    [term_taxonomy_id] => 19892
    [taxonomy] => category
    [description] => 
    [parent] => 157
    [count] => 3
    [filter] => raw
    [cat_ID] => 19892
    [category_count] => 3
    [category_description] => 
    [cat_name] => Tech-X
    [category_nicename] => tech-x
    [category_parent] => 157
    [is_post] => 
)

Introducing XSim: Achieving high-quality Photonic IC tape-outs

Introducing XSim: Achieving high-quality Photonic IC tape-outs
by jrobcary on 08-21-2024 at 10:00 am

txcorp XSim Example Photonics

Similar to analog circuits, which use EM waves at communications frequencies, components in photonics integrated circuits (PICs), which use EM waves at optical frequencies, are sensitive to layout and manufacturing variations—arguably more so.  Similar to their semiconductor counterparts, which transmit information… Read More


CTO Interview: John R. Cary of Tech-X Corporation

CTO Interview: John R. Cary of Tech-X Corporation
by Daniel Nenni on 01-27-2023 at 6:00 am

20220307SpanishHillsTacoDinner blurred 1

John R. Cary is professor of physics at the University of Colorado at Boulder and CTO of Tech-X Corporation. He received his PhD from the University of California, Berkeley, in Plasma Physics.  Prof. Cary worked at Los Alamos National Laboratory and the Institute for Fusion Studies at the University of Texas, Austin, prior to joining… Read More


Understanding Sheath Behavior Key to Plasma Etch

Understanding Sheath Behavior Key to Plasma Etch
by Scott Kruger on 08-11-2022 at 10:00 am

Final Edit EtchingProcess Illustration

Readers of SemiWiki will be well aware of the challenges the industry has faced in photolithography in moving to new nodes, which drove the development of new EUV light sources as well as new masking techniques.  Plasma etching is another key step in chip manufacturing that has also seen new challenges in the development of new sub-10nm… Read More