WP_Term Object
(
    [term_id] => 19892
    [name] => Tech-X
    [slug] => tech-x
    [term_group] => 0
    [term_taxonomy_id] => 19892
    [taxonomy] => category
    [description] => 
    [parent] => 157
    [count] => 1
    [filter] => raw
    [cat_ID] => 19892
    [category_count] => 1
    [category_description] => 
    [cat_name] => Tech-X
    [category_nicename] => tech-x
    [category_parent] => 157
    [is_post] => 
)
            
Tech x logo 300x75 200x50 1
WP_Term Object
(
    [term_id] => 19892
    [name] => Tech-X
    [slug] => tech-x
    [term_group] => 0
    [term_taxonomy_id] => 19892
    [taxonomy] => category
    [description] => 
    [parent] => 157
    [count] => 1
    [filter] => raw
    [cat_ID] => 19892
    [category_count] => 1
    [category_description] => 
    [cat_name] => Tech-X
    [category_nicename] => tech-x
    [category_parent] => 157
    [is_post] => 
)

Understanding Sheath Behavior Key to Plasma Etch

Understanding Sheath Behavior Key to Plasma Etch
by Scott Kruger on 08-11-2022 at 10:00 am

Final Edit EtchingProcess Illustration

Readers of SemiWiki will be well aware of the challenges the industry has faced in photolithography in moving to new nodes, which drove the development of new EUV light sources as well as new masking techniques.  Plasma etching is another key step in chip manufacturing that has also seen new challenges in the development of new sub-10nm… Read More