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New ERC Tools Catch Design Errorsby glforte on 02-11-2011 at 2:18 pmCategories: EDA, Siemens EDA
A growing number of reports highlight a class of design errors that is difficult to check using more traditional methods, and can potentially affect a wide range of IC designs, especially where high reliability is a must.By Matthew Hogan
Today’s IC designs are complex. They contain vast arrays of features and functionality in … Read More
EDA and Wall Streetby Paul McLellan on 02-11-2011 at 1:25 pmCategories: EDA
Good news in a way: Merrill Lynch (or Bank of America Merrill Lynch as I suppose we have to get used to calling them) have re-started coverage of EDA with a 20 page report on the industry, much of which is spent on explaining how the industry segments out and who is strong in which segments, stuff that most people reading this site already… Read More
When I worked at Intel as a circuit design engineer I could talk directly with the technology development engineers to understand how to really push my DRAM designs and get the smallest possible memory cell layout that would still yield well, provide fast access time, and long refresh cycles.
(United States Patent 6661699. Inventor:… Read More
"Managing increasing complexity through higher-level of abstraction: What the past has taught us about the future" Dr. Ajoy Bose, Atrenta CEO
Here is the abstract:
Time to market and design complexity challenges are well-known; we have all seen the statistics and predictions. A well-defined strategy to address … Read More
During the most recent conference call (transcript), TSMC not only beat revised estimates and announced record spending levels for 2011, Morris Chang also officially announced that a 450mm fab (Fab 12 Phase VI) is currently in the planning stages with target production @ 20nm in 2015. This is HUGE!
According to Morris Chang:
“For… Read More
Cadence at DesignCon 2011
I met with Rahul Deokar, Product Manager this morning to review 9 slides that tell the story of Giga-gates and GigaHz systems design at Cadence. Their updated P&R system now completes jobs 2X faster for 28nm designs.
Silicon Realization Trends and Challenges:
Silicon Realization – end to end digital… Read More
Process Design Kit (PDK) development is one of the most entertaining things to watch in the semiconductor design world. It is kind of like the Golden Snitch in the game of Quidditch. No matter how rough EDA vendors play the game, no matter what the score is, it’s the vendor that “gets” the Golden PDK Snitch that wins the semiconductor… Read More
“IP Innovation is moving from component level to system level”. This mantra was heard during the conference, from various speakers: during the keynote talk by Ganesh R. from Gartner and presentation “Integration-Optimized IP from Cadence” by Ranga Srinivasan, also during discussion around coffee (or a glass … Read More
The Common Platform Technology Forum last week was not well attended, less than half than the GlobalFoundries Conference. It was deja vu of previous CP forums but there were a couple of surprises to go with the disappointment. The lunch line was long, but fortunately I was escorted to the press lunch featuring VIP’s from Samsung,… Read More
I just read the press release from TowerJazz and Tanner EDA about how an AMS designer can use schematic symbols and layout generators in Tanner EDA tools for the TowerJazz 0.18um node. This is made possible because of the growing iPDK (Interoperable Process Design Kits) movement.
In the old days each foundry would have to staff up… Read More
Chip War without Soldiers