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Webinar: Signoff for Thermal, Reliability and More in Advanced FinFET designs

Webinar: Signoff for Thermal, Reliability and More in Advanced FinFET designs
by Bernard Murphy on 09-17-2017 at 7:00 am

In automotive applications, advanced FinFET processes are great for high levels of integration and low power. But they also present some new challenges in reliability signoff. Ansys will be hosting a webinar to highlight the challenges faced by engineers trying to ensure thermal, electromigration (EM) and electrostatic discharge… Read More


Semiconductor Device Physics, Lab in a Box

Semiconductor Device Physics, Lab in a Box
by Daniel Payne on 09-13-2017 at 12:00 pm

One of my favorite classes in college was the lab exercise, mostly because we actually got to use real electronics and then measure something, finally writing it up in our lab notebooks. The issue today is that a college student taking Electrical Engineering probably doesn’t have much access to 10nm FinFET silicon for use… Read More


Samsung, Synopsys and Qualcomm at DAC

Samsung, Synopsys and Qualcomm at DAC
by Daniel Payne on 08-24-2017 at 12:00 pm

I’m a user of many Samsung products as my family has Samsung Galaxy smart phones and my MacBook Pro uses Samsung SSD for storage, so at DAC I attended a breakfast panel with presenters from Samsung, Synopsys and Qualcomm. This was the second day of DAC and they served us breakfast, and with the big names on the panel the room was… Read More


TSMC OIP Ecosystem Forum 2017 Preview!

TSMC OIP Ecosystem Forum 2017 Preview!
by Daniel Nenni on 08-23-2017 at 12:00 pm

The TSMC OIP Ecosystem Forum is upon us again. I have yet to meet a disappointed attendee so it is definitely worth your time: Networking with more than 1,000 semiconductor professionals, the food, mingling with the 50+ EDA, IP, and Services Companies, the food, and of course the content. The 7nm and 7nm EUV updates alone are worth… Read More


Extraction Features for 7nm

Extraction Features for 7nm
by Tom Dillinger on 08-21-2017 at 12:00 pm

Frequent Semiwiki readers are familiar with the importance of close collaboration between the foundries and EDA tool developers, to provide the crucial features required by new process nodes. Perhaps the best illustration of the significance of this collaboration is the technical evolution of layout parasitic extraction.… Read More


EDA Machine Learning from the Experts!

EDA Machine Learning from the Experts!
by Daniel Nenni on 08-16-2017 at 7:00 am

Traditionally, EDA has been a brute force methodology where we buy more software licenses and more CPUs and keep running endless jobs to keep up with the increasing design and process complexities. SPICE simulation for example; when I meet chip designers (which I do quite frequently) I ask them how many simulations they do for a … Read More


CEO Interview: Jim Gobes of Intrinsix

CEO Interview: Jim Gobes of Intrinsix
by Daniel Nenni on 08-14-2017 at 7:00 am

Experience gives us the ability to make better decisions and in a fast moving industry like semiconductors, experience is critical. As chips get more integrated and complex the number of design decisions that must be made increases at a dramatic rate. Process technologies for example, never in the history of semiconductors have… Read More


Semicon West – The FDSOI Ecosystem

Semicon West – The FDSOI Ecosystem
by Scotten Jones on 07-21-2017 at 12:00 pm

At Semicon West last week I attended presentations by Soitec and CEA Leti, and had breakfast with CEA Leti CEO Marie Semeria, key members of the Fully Depleted Silicon On Insulator (FDSOI) ecosystem. I have also seen some comments in the SemiWiki forum lately that make me believe there is some confusion on the roles of different companies… Read More


Standard Node Trend

Standard Node Trend
by Scotten Jones on 07-15-2017 at 4:00 pm

I have previously published analysis’ converting leading edge logic processes to “standard nodes” and comparing standard nodes by company and time. Recently updated details on the 7nm process node have become available and in this article, I will revisit the standard node calculations and trends.… Read More


GlobalFoundries 7nm and EUV Update!

GlobalFoundries 7nm and EUV Update!
by Daniel Nenni on 06-13-2017 at 7:00 am

Scott Jones and I had the opportunity to talk again with Gary Patton, GlobalFoundries CTO and SVP of R&D for a quick update on 7nm and EUV. Gary has been at GF for two years now with more than 500 other technologists from the IBM semiconductor acquisition. 7nm is the first IBM based process from GF (14nm was licensed from Samsung),… Read More