In today’s world where every device functions intelligently, it automatically becomes active on any kind of stimulus. The problem with such intelligence is that it can function unfavorably on any kind of bad stimulus. As the devices are complex enough in the form of SoCs (which at advanced process nodes are more susceptible to … Read More
Tag: reliability
ANSYS Tools Shine at FinFET Nodes!
In the modern semiconductor ecosystem we are seeing rapid advancement in technology breaking past once perceived limits; 28nm, 20nm, 16-14nm, 10nm and we are foreseeing 7nm now. Double and multi-patterning are already being seen along with complex FinFET structures in transistors to gain the ultimate advantages in PPA from… Read More
Sidense overlays OTP on TSMC 16nm FinFET
Process shrinks, which have served us well for most of the Moore’s Law journey, are reaching their limits. For switching transistors, the biggest problems of leakage current and gate oxide vulnerability in planar MOSFETs have led the industry to new 3D microstructures such as FinFET. For non-volatile memory, the problem is generally… Read More
FinFET Design for Power, Noise and Reliability
IC designers have been running analysis tools for power, noise and reliability for many years now, so what is new when you start using FinFET transistors instead of planar transistors? Calvin Chow from ANSYS (Apache Design) presented on this topic earlier in the summer through a 33 minutewebinar that has been archived. There is… Read More
IO Design Optimization Flow for Reliability in 28nm
User group meetings are a rich source of information for IC designers because they have actual designers talking about how they used EDA tools in their methodology to achieve a goal. Engineers at STMicroelectronicspresented at a MunEDAUser Group on the topic: I/O Design Optimization Flow For Reliability In Advanced CMOS Nodes.… Read More
Ensuring ESD Integrity
Electro Static Discharge (ESD) is a fact of life for IC designs and has been ever since electronics were first created and then started failing because of sudden, large currents flowing through the design caused by human, processing or machine contact. It’s just too expensive to layout an IC today, fabricate it, test for … Read More
Intel & Ansys Enable 14nm Chip Production
In the semiconductor industry, it feels great to hear about the process technology shrinking to lower nodes along with innovative transistor structures that offer major gains in PPA (Power, Performance and Area). However, it requires huge investment of capital, time and effort from foundries to conceptualize, prototype and… Read More
Five Things You Don’t Know About MunEDA
So first the one thing that you do know. MunEDA are based in Munich which makes them German. I have to confess that until I got involved helping them a bit with some marketing stuff that that was about all I knew about them too.
So now five things that you might not know:
1. MunEDA have a much wider customer list that you know and would even… Read More
FinFET Based Designs Made Easy & Reliable
Although semiconductor manufacturing has taken off with FinFET based process technology which provides lucrative payoffs on performance improvement, power reduction and area saving in devices for high density and high performance SoC demand of modern era, apprehensions remain about its reliability due to reduced noise … Read More
High Sigma Yield Analysis and Optimization at DAC
When I hear the phrase “high sigma” I think of the EDA vendor Solido, however at DAC on Monday I visited another EDA company called MunEDAthat has several products of interest to transistor-level IC designers. I was able to speak with three different people from MunEDA and here’s what I learned.… Read More