There is growing awareness that EUV lithography is actually an imaging technique that heavily depends on the distribution of secondary electrons in the resist layer [1-5]. The stochastic aspects should be traced not only to the discrete number of photons absorbed but also the electrons that are subsequently released. The electron… Read More




What is Your Ground Truth?
When my son bought a 2020 Chevrolet Bolt EV a couple of years ago, I was excited. I wanted to see what the Xevo-supplied Marketplace (contextually driven ads and offers) looked like and I was also curious as to what clever navigation integration GM was offering.
I was swiftly disappointed to discover that Xevo Marketplace was not… Read More
Podcast EP100: A Look Back and a Look Ahead with Dan and Mike
Dan and Mike get together to reflect on the past and the future in this 100th Semiconductor Insiders podcast episode. The chip shortage, foundry landscape, Moore’s law, CHIPS Act and industry revenue trends are some of the topics discussed.
The views, thoughts, and opinions expressed in these podcasts belong solely to … Read More
CEO Interview: Kai Beckmann, Member of the Executive Board at Merck KGaA
Kai Beckmann is a Member of the Executive Board at Merck KGaA, Darmstadt, Germany, and the CEO of Electronics. He is responsible for the Electronics business sector, which he has been leading since September 2017. In October 2018, Kai Beckmann also took over the responsibility for the Darmstadt site and In-house Consulting. In… Read More
Understanding Sheath Behavior Key to Plasma Etch
Readers of SemiWiki will be well aware of the challenges the industry has faced in photolithography in moving to new nodes, which drove the development of new EUV light sources as well as new masking techniques. Plasma etching is another key step in chip manufacturing that has also seen new challenges in the development of new sub-10nm… Read More
WEBINAR: Design and Verify State-of-the-Art RFICs using Synopsys / Ansys Custom Design Flow
The design and characterization of RF circuits is a complex process that requires an RF designer to overcome a variety of challenges. Not only do they face the complexities posed by advanced semiconductor processes and the need to meet the demanding requirements of modern wireless standards, designers must also account for electromagnetic… Read More
Flex Logix Partners With Intrinsic ID To Secure eFPGA Platform
While the ASIC market has always had its advantages over alternate solutions, it has faced boom and bust cycles typically driven by high NRE development costs and time to market lead times. During the same time, the FPGA market has been consistently bringing out more and more advanced products with each new generation. With very… Read More
Podcast EP99: How Cliosoft became the leading design data management company
Dan is joined by Srinath Anantharaman, who founded Cliosoft in 1997 and serves as the company’s CEO. He has over 40 years of software engineering and management experience in the EDA industry.
Dan and Srinath explore the original focus for Cliosoft and how that has expanded over the years. The future of Cliosoft, as well as its plans… Read More
Coverage Analysis in Questa Visualizer
Coverage analysis is how you answer the question “have I tested enough?” You need some way to quantify the completeness of our testing; coverage is how you do that. Right out of the gate this is a bit deceptive. To truly cover a design our tests would need to cover every accessible state and state transition. The complexity of that task… Read More
Intel and TSMC do not Slow 3nm Expansion
The media has gone wild over a false report that Intel and TSMC are slowing down 3nm. It is all about sensationalism and getting clicks no matter what damage is done to the hardworking semiconductor people, companies and industry as a whole. And like lemmings jumping off a cliff, other less reputable media outlets perpetuated this… Read More
Weebit Nano Moves into the Mainstream with Customer Adoption