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So Intel 4 is 2 EUV layers less (13) than TSMC N5 (15) but supposedly half-a-node denser?
I somehow doubt that TSMC use EUV layers where they're not needed, and I also doubt that Intel (with no real EUV experience) know better then TSMC (now on their 3rd EUV process *in mass production*) about how many EUV layers are needed to get a high-yielding process -- in fact, precisely the reverse, given Intel's track record.
I'll believe all those Intel 4 numbers when it's in volume production with yield as good as TSMC... ;-)
There has always been a large difference in lithography between tsmc foundry and Intel microprocessor. The number of EUV layers depends of the design rules.