Future of ion implantation ??

[Louis_liu]

the application of implantaion process seems slowing down,
is there any new idea for this process?, AMAT recommend strongly their PLAD , is that the final solution for finfet or nano wire conformal doping

 

[Li Yisuo]

Implantation damage needs certain thermal budget, which deteriorates the short channel effect and blockades the path for further scaling.

PLAD is great innovation for current tech node and can be used for long time.

Solid source doping would be considered as an alternative solution simply because it generates less damage.

 

[Scotten Jones]

There is an emerging area for ion implantation for modifying materials properties. I have written about it here: https://www.semiwiki.com/forum/content/4152-ion-implant-its-not-just-doping-anymore.html