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Polysilicon is just short for POLYcristalline SILICON. Highly doped polysilicon was once used instead of metal for the gate electrode. There are (were) a few good reasons for this, but you should probably refer to a solid reference book instead on multiple YT videos if you want to understand a...
Hi, I see a major problem in your pdf: in step 7, n-doped silicon cannot magically appear in the voids of step 6 (certainly not as a consequence of PR removal). As a matter of fact, in step 6 there is no reason to etch away that bit of silicon below the oxide. Doping (typically performed by ion...
