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SPIE Days 3 and 4:
Anna Lio of Intel presented EUV resists: What’s next?
Intel wants to insert EUV at 7nm but it has to be ready and economical. Critical Dimension Uniformity (CDU), Line Width Roughness (LWR) and edge placement/stochastics are all stable on 22nm, 14nm and 10nm pilot lines.… Read More
It is that time again, time for the originators of the pure-play foundry business to update their top customers and partners on the latest process technology developments and schedules. More specifically, all of the TSMC FinFET processes (16nm, 10nm, 7nm, and beyond), TSMC IP portfolio (CMOS image sensor, Embedded Flash, Power… Read More
Since a few years China has been very aggressive in acquiring semiconductor companies around the world. Last year, Chinese government along with PE (Private Equity) and other investors in China announced an ambitious plan under which more than $150 billion were to be invested over next 5 to 10 years in developing semiconductor… Read More
Well today is the day. I am officially retired from Fairchild after 36 years and 9 months on the job. I have worked for Fairchild Camera and Instrument, Fairchild a Schlumberger Company, National Semiconductor and Fairchild Semiconductor. It’s been everything I was hoping for and more. By the way, I walked out the front door… Read More
At the high end of the Atmel product spectrum resides SAMA5 based on an ARM Cortex-A5 core. With an MMU supporting Linux or Android, plus on-the-fly memory encryption and ARM TrustZone in some variants, the SAMA5 family is drawing interest from IoT app developers. We’ll look at three examples, all illustrating how important seamless… Read More
Day 1 of the SPIE conference featured a number of customer updates on the status of their EUV programs. On Tuesday morning we got to hear ASML’s update on their work.… Read More
At this week’s Embedded World 2016, Atmel is heading back to 8-bit old school with their news, straight to the low pin count end of their MCU portfolio with a significant upgrade to the tinyAVR family.
According to Atmel’s briefing package, development of the ATtiny102 and ATtiny104 has been in progress for some time.… Read More
Today is the first day of the SPIE Advanced Lithography Conference and Extreme Ultraviolet (EUV) updates were a big focus.… Read More
Evolving opportunities call for new and improved solutions to handle data, bandwidth and power. Moving forward, what will be the high-growth applications that drive product and technology innovation? The CAGRs for smartphone and data center continue to be very strong and healthy. … Read More
SPIE is next week so if you would like to meet me in person that is where I will be. SPIE is the big lithography and patterning conference for semiconductor professionals. Since I work with the foundries during my day job, SPIE is an important conference. SemiWiki blogger Scott Jones will also be there. During the day Scott does semiconductor… Read More
TSMC N3 Process Technology Wiki