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On Thursday July 9 Imec held a virtual technology forum. Imec is one of the premier research organizations working on semiconductor technology and their forums are always interesting. My area of interest is process technology and the following are my observation in that area from the forum.
Luc Van Den Hove
Luc Van Den Hove is the… Read More
I had the pleasure of spending time with Hiren Majmudar in preparation for the upcoming AI Accelerators webinar. As far as webinars go this will be one of the better ones we have done. Hiren has deep experience in both semiconductors and EDA during his lengthy career at Intel and now with a pure play foundry. He is intelligent, personable,… Read More
When Analog FastSPICE was first introduced in 2006 it changed the landscape for high performance SPICE simulation. During the last 14 years it has been used widely to verify advanced nanometer designs. Of course, since then the most advanced designs have progressed significantly, making verification even more difficult. Just… Read More
In this, the second part of a two-part series we delve further into defining worst case, this time focusing specifically on device performance.
In the last blog we talked about the steady increase in power density per unit silicon area and how worst case is definitely getting worse. We discussed how in each new FinFET node the dynamic… Read More
Summary
A recent process enhancement in advanced nodes is to support the fabrication of contacts directly on the active gate area of a device. At the recent VLSI 2020 Symposium, the critical advantages of this capability were highlighted, specifically in the context of the behavior of RF CMOS devices needed for 5G designs.
Introduction… Read More
Summary
As a result of extensive focus on the development of workfunction metal (WFM) deposition, lithography, and removal, both FinFET and gate-all-around (GAA) devices will offer a wide range of Vt levels for advanced process nodes below 7nm.
Introduction
Cell library and IP designers rely on the availability of nFET and pFET… Read More
Summary
Design Technology Co-Optimization (DTCO) analysis was pursued for library cell PPA estimates for gate-all-around (GAA) devices and new metallurgy options. The cell design and process recommendations are a bit surprising.
Introduction
During the “golden years” of silicon technology evolution that applied Dennard… Read More
Self-aligned quadruple patterning (SAQP) is the most widely available technology used for patterning feature pitches less than 38 nm, with a projected capability to reach 19 nm pitch. It is actually an integration of multiple process steps, already being used to pattern the fins of FinFETs [1] and 1X DRAM [2]. These steps, shown… Read More
Talking Sense With Moortec…Are You Listening?!by Tim Penhale-Jones on 05-04-2020 at 10:00 amCategories: FinFET, IP, Moortec
It almost doesn’t matter what your job may be, whether in the public sector or a private company, or how technical or how dangerous, many of life’s adages and sayings can be interpreted to have some direct meaning for all of us.
Over the years in our personal lives, we have been constantly advised that prevention is better than cure…certainly… Read More
We live in an age of abundant information. There is a tremendous exchange of ideas crisscrossing the world enabling new innovative type of products to pop up daily. Therefore, in this era there is a greater need to understand competitive intelligence. Corporate companies today are interested in what other competitors are brewing… Read More
Facing the Quantum Nature of EUV Lithography