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Advancements in Nanoscale Manufacturing

Advancements in Nanoscale Manufacturing
by Paul McLellan on 04-10-2014 at 1:40 pm

I’m at the GSA Silicon Summit today, at the computer history museum. The first panel session this morning was about future process technology. It was moderated by Joe Sawicki of Mentor with a panel consisting of Rob Aitken from ARM, Paul Farrar of G450C, Peter Huang of TSMC, John Kibarian of PDF Solutions and someone from Applied Materials whose name I didn’t note down but doesn’t appear in the program.

There have been two constants in semiconductor manufacturing. #1 is Moore’s Law and #2 is that two nodes out we run into a wall and it can’t be done. For instance, in 1986 “optical litho is dead”. How did that work out? But things are accelerating. Planar lasted for decades. Hi-K metal gate lasted for 2 nodes. FinFET just a few, maybe to 7nm, maybe not.

Since I am talking about it at EDPS next week, I was intrigued that the first topic was whether FD-SOI has any room to make a play. The general opinion is that it will have a place since it is already in production (at ST) but that FinFET has sucked up all the expertise. It takes too much effort to do a process generation and the large system companies have insisted that the foundry industry chase Intel in FinFET so the entire foundry industry (except ST) have consolidated on FinFET and that is what the whole ecosystem is focused on. If you do a new technology and your competitors do not, then you are vulnerable.

EUV: closer than in 2002 (which is not saying that much!). Most issues relate to manufacturing and being cost-effective, rather than technical. The economic challenge cannot be overcome. We are already looking at double patterning if it comes in for the 7nm or 5nm node.

There was a lot of discussion about whether 20nm and 16nm are cost reduction nodes. Everyone has seen the graphs showing that cost per transistor goes up but those charts assume parametric yields go down every process generation but they don’t. Everyone has learned and the customers work with the foundry for years now. Foundries have learned a lot about design. The IP and fabless companies have learned a lot about transistors. 3 years of work and then a 1-2 year product cycle and then on to the next node. Test vehicles are run much earlier, everyone is investing in the nodes earlier. The general opinion was that each of these nodes would, in fact, be a cost reduction.

What about 10nm? 7nm? FinFETs are probably running out of steam by then and we will need gate all-round for 7nm. Industry will look collectively and decide if we want horizontal nanowires and if we do they will happen.

What about the decline in the number of manufacturers? Is that a benefit or a liability? Even if the number of fabs is limited due to the cost of entry the ecosystem will exist around them. There are some advantages from focus (like everyone agreeing to FinFET) but also fewer things are being explored in R&D so some choices will turn out to be wrong or suboptimal. There is some variation such as gate-first vs gate-last, FinFET vs FD-SOI, Intel introducing FinFET at 22nm and everyone else at 14/16nm. But not as much as there used to be. And a cynic would say that 16nm is actually a variant of 20nm with different transistors. Node names for sure do not make sense.

The then chairman of PDF solutions 12 years ago said “it will eventually come down to a competition of countries” and it is clear that we are close to that stage now. TSMC in Taiwan (with all sorts of tax breaks from the government), GF in US (with tax breaks from NY state), Samsung in Korea (probably with all sorts of government support too). Of course there are fabs in other places (GF in Singapore and Germany, Samsung in Texas etc).

What about 450mm wafers? Low power is the driver of process today whereas 450mm is purely about cost reduction. So it depends on if and when the industry decides that there is an acute need for cost reduction. There need to be a lot of fully loaded fabs ready to replace all the equipment. But one big issue I’ve commented on before is that lithography scaling with wafer size does not work. Twice the area takes twice the time and about 80% of the cost is in tools that process die by die not wafer-at-a-time. So as long as Moore’s law is scaling every couple of years 450mm is not needed. If it slows to 4 years and demand for transistors continues to increase then it will not be economical not to switch to 450mm. But decisions need to be made soon to intercept the future.

But, like in Hollywood, nobody knows anything. 15 years ago if you said we would all be using double patterning, FinFETs, gating every power domain and so on then you’d have been laughed out of the room. But that is where we are.

The challenges we face are maybe easier than other parts of the electronic ecosystem. Will batteries improve in capacity by 10X? Probably not. Will transistors consume 10 times less power? Maybe.

It has been estimated that 40% of GDP growth is due to Moore’s Law. That is maybe $500B a year. So the leverage is huge to increase the spend to keep things on track.


More articles by Paul McLellan…


Death to ‘content marketing’

Death to ‘content marketing’
by Eric Esteve on 04-10-2014 at 9:39 am

If you ask me: Are you blogging for Semiwiki? The real answer could be:

No, I am just telling stories, but these are true stories! This idea is perfectly illustrated by this post that I found on:

http://www.pivotalpod.com/death-to-content-marketing/

And in particular this extract, as it is something that I could have written (assuming I write good English, but that’s not the case!):

Pictures are stories. Memes are stories. Videos are stories. Movies with product placement are stories. Billboards are stories. Stories that were carefully placed by the PR team are stories. Bumper stickers are stories. I can tell more about someone from their bumper sticker than I can from a one-hour drunken conversation at a marketing convention.
That’s called branded entertainment, and everyone sees through it anyway. If the story’s good enough, they don’t care that you’re trying to sell them something.

And nobody gives a crap whether your company was founded by a one-legged farmer in 1806, a 17-year-old with a car battery and a Commodore 64, or a bunch of Stanford students huddled around an iPad at Starbucks.

If you prefer the genuine blog, here it is:

Death to ‘content marketing’
The marketing world is full of terrible jargon, from the somehow-still-pervasive “industry-leading” and “best in class” that peppers one-sheets and press releases to the way that people describe themselves on LinkedIn. Are you seriously an “innovative, effective, driven strategic expert”? I think not.

Today iMedia called outsomething else that needs to be changed from jargon to real-life language: CONTENT MARKETING. Yes, that’s right. Our lifeblood. They make a good point:

Normal people don’t talk like this. Nobody says, “I’m watching the coolest YouTube content right now.” But that’s what it’s called. And I know, I know, the new Google algorithm favors content. But it needs to die, because making good content is hard work, and getting people to see it and share it is even harder work.

[Ed note: I removed the exclamation point on the end of that paragraph, because I am on a vendetta against all exclamation points. More on that in another post.]

A related term that drives them batty, too, is “consume.” People don’t consume content like a bag of Garlic Parmesan Pretzel Crisps. It just became the catch-all phrase when we realized that you can’t just use “read” because the content world had expanded far beyond text articles and started including videos, infographics, webinars, and other types of interactive experiences that engage more than just the reading mind.

– Dying by consumption is a real threat.

So are there better terms than content and consume? Maybe, maybe not. But something does need to change. Probably right around the same time that we find a new phrase for “brand storytelling.” As told by the author, who is from the agency Supercool Creative in LA:

Eric Esteve


Mentor’s New Enterprise Verification Platform

Mentor’s New Enterprise Verification Platform
by Paul McLellan on 04-10-2014 at 2:01 am

I spent the morning at Mentor where they announced their new enterprise verification platform. This was a general announcement but was attended by a lot of the international press who were over on a GlobalPress tour (the event that used to take up camp at Chaminade).

But first Wally Rhines spent 30 minutes giving a nice overview of the history of verification, building up to the fact that this announcement is really verification 3.0, with a unified environment for simulation, emulation and formal with support for both hardware and software debugging. The big word is “common”: common debug, common verification IP, common user interface, common testbench stimulus, common assertions and common coverage. He passed the reins to John Lenyo, who is the general manager of verification to go over the details.


There are actually four new platform components:

  • new emulation operating system: Veloce OS3
  • new high-performance, unified HW debugger: Visualizer
  • new unified software debugger: Codelink
  • new verification IP (VIP) that supports Questa and Veloce

The underlying engines remain unchanged: Vista Virtual Prototype, the Questa Formal and Questa Simulation engines, and Veloce emulation.

The new emulation operating system allows emulators to deliver simulation-like capabilities. It replaces hardware add-ons with virtual peripherals. It simplifies configuration. The result is that Veloce can be configured and run from anywhere on the network and so it can be moved into the data-center. Note that there is no new emulator, just a new operating system. It is backwards compatible and runs on all old Veloce systems, the biggest of which have a capacity of 1B gates (and two of these can be linked to get to 2B). The result is that it is much more straightforward to bring up a design for emulation (no playing with cables). It supports UPF for power verification, SystemVerilog for functional coverage and assertion-based verification and SystemVerilog, UVM and C/C++ testbenches. All the coverage metrics are captured into the single coverage database shared with the other engines called UDCB.

Visualizer is a new high-performance high-capacity debugger (for hardware). All verification engines share the same debugger. Of course it has full tandads support and also supports different abstraction levels: transaction and protocol debug, performance and system-level analysis and HW/SW system debug.

For software development there is a new debugger Codelink that runs on both Questa and Veloce OS3. It allows software debug to be done on a shared Veloce emulator (of course there have to be enough gates for all the designs). It can handle up to about 10 simultaneous users.

Finally, the existing VIP that Mentor has is all moved so that it fully supports both Questa and Veloce. This gives testbench portability across simulation and emulation, common validation/QA tests and a common user tesetbench and device-under-test (DUT) interface.


Although they weren’t announcing anything today, John hinted at announcements coming in the next 12 months extending the enterprise verification platform with its unified debuggers and databases to FPGA prototypes, first silicon, production test and even fielded product.

After the presentation we were taken to their server room where they have several Veloce emulators. These are used for evaluations, Mentor doesn’t provide an emulation service. Then lunch.


More articles by Paul McLellan…


FD-SOI, FinFET, 3D in Monterey

FD-SOI, FinFET, 3D in Monterey
by Paul McLellan on 04-09-2014 at 5:40 pm

Last night the IEEE Silicon Valley Chapter had a panel session that was in some ways a preview of some of what will be discussed at the Electronic Design Process Symposium in Monterey next Thursday and Friday. At EDPS Herb Reiter organized a session on FinFET, 3DIC and FD-SOI (sort of how many buzzwords can you get into one set of titles). Apparently I drew the short straw since I get the last presentation of the day, the one between everyone and a glass of wine and dinner, and a dinner keynote by Wally Rhines (who coincidentally sat next to me at lunch just a couple of hours ago).

I am talking about FD-SOI. So I got asked to present FD-SOI since it is the only alternative to FinFET that is out there. Unfortunately ST is the only company driving the technology and building the ecosystem (mainly wafer blanks) required. GlobalFoundries announced that they would have FD-SOI as well as FinFET but…that seems no longer to be the case.

I think of FD-SOI and FinFETs as being two solutions to the same problem, namely that in bulk CMOS the gate no longer strongly controls the channel so all the transistors are never completely off. This is why leakage power became such a big problem in recent nodes. The solution is to make the channel thin and the two ways to do this are to make it a thin vertical fin (and then wrap the gate around 3 sides for even better control) or to make the channel horizontally but thin by backing it up with an insulator (so no current can get around the channel since an insulator won’t let current flow).


Conveniently for me, Handel Jones of IBS, just came out with a report where he and his people have done an analysis of the costs of FinFET vs FD-SOI which comes out strongly in favor of FD-SOI. At 14nm/16nm there is a cost saving using FD-SOI of nearly 30% versus bulk FinFET.

The challenge, of course, is whether any high-volume customer will step up and demand this cost-saving. Instead, the expectation is that the high volume of FinFETs will lead to more yield learning than lower volume FD-SOI so that this will eventually be eroded.

Apart from Wally Rhines dinner keynote, the opening keynote on Thursday is by Chris Lawless of Intel and the opening keynote on Friday is Martin Lund of Cadence.

I will have a lot more to say next week. Details of the agenda are here. Registration is here. Get a $50 discount by using the code semiwikigo. I hope to see you there.


More articles by Paul McLellan…


Addressing MCU Mixed Signal Design Challenges

Addressing MCU Mixed Signal Design Challenges
by Daniel Payne on 04-09-2014 at 2:23 pm

The emerging market for IoT and wearable devices are designed with mixed-signal IP that includes: embedded CPU, flash, analogue and radio.EDA and IP companies have recently worked together to allow us to design an MCU with mixed-signal IP blocks more efficiently. This morning I attended a webinar with presenters from ARMand Cadence Design Systems. I’ve been following ARM more closely after they acquired IP provider Artisan back in 2004.


Continue reading “Addressing MCU Mixed Signal Design Challenges”


IP Reuse and Management in Monterey!

IP Reuse and Management in Monterey!
by Daniel Nenni on 04-08-2014 at 10:30 pm

One of the benefits of being part of SemiWiki is building relationships with a wide variety of companies covering every semiconductor design application imaginable. We are blessed, absolutely. Another benefit of being part of SemiWiki are the invitations to attend, participate, and even organize events such as EDPS. Last year I organized FinFET Day which was a huge success. This year I organized IP Day with a keynote from Martin Lund of Cadence and presenters from eSilicon, Arteris, IPextreme, Mentor, and Atrenta. Unfortunately we had a speaker cancellation so I asked ClioSoft to step in and they graciously accepted.

Design management (DM) is one of the applications that I had not been familiar with before SemiWiki but have grown to respect thanks to ClioSoft. ClioSoft was one of SemiWiki’s first subscribers and today they are the model of success for emerging companies. Looking at their landing page you will see dozens of blogs on every aspect of DM including customer experiences from semiconductor companies big and small. Design Reuse and IP Management is an integral part of DM and Ranjit Adhikary from ClioSoft will be explaining in more detail what that means exactly and where it is heading.

If you look at the Semiconductor IP usage trends over the last five process nodes (65nm, 40nm, 28nm, 20nm, 16nm) the number of unique IP per tape-out is increasing while the ability to re-use IP across nodes is dropping. And thanks to the ultracompetitive mobile market with new products coming at us every day, design cycles are incredibly short and complex. Design Reuse and IP Management is critical to our success moving forward so this is a workshop you do not want to miss:

The Electronic Design Processes Symposium (EDPS) provides a forum for a cross-section of the top thinkers, movers and shakers who focus on how chips and systems are designed to discuss state-of-the-art electronic design processes and CAD methodologies. The workshop focuses on the improvement of the overall design process, rather than on the functions of the individual tools themselves.

Featuring the following 2014 Keynote Speakers:

  • Chris Lawless – Director, Intel
  • Wally Rhines – CEO, Mentor Graphic
  • Martin Lund – SVP, Cadence

Program includes the following sessions:
Thursday 4/17 Sessions 8:00AM -5:45 PM

  • Design Flow Challenges (including Panel)
  • Pre-Silicon SW Development Platforms
  • Technology Updates – FinFET, 3D-IC, FD-SOI

Thursday 4/17 Dinner Keynote 6:30PM
Wally Rhines, CEO, Mentor Graphics

Friday 4/18: IP Day 8:00AM-3:00PM

  • IP Integration, Design, Reuse (Session)
  • IP Verification and Qualification (Session)

Program includes engineers and key executives from the following companies:
Altera, Intel, Synopsys, Cadence, ClioSoft, Mentor, eSilicon, Atrenta, and more…

See www.eda.org/edps, to see the detailed Program, Registration information, and news/review of this event. When registering use Promo Code: SemiWikiGofor $50 off

This Symposium will be held at the www.montereybeachresort.com.

More Articles by Daniel Nenni…..

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Who Wants to Live in Malta?

Who Wants to Live in Malta?
by Paul McLellan on 04-08-2014 at 11:49 am

Who wants to live in Malta? A beautiful island in the eastern Mediterranean with wonderful food…wait, that’s the wrong Malta. I’m talking about the one in upstate New York where GlobalFoundries have their big fab 8 and also their technology development center (also known as fab 8.1).

So why would you want to live there? Let’s get one thing out of the way. The weather is cold for 3 months in winter. But if you can make winter your friend, there is lots around: the Adirondack mountains, lake Placid, lake George. The education is great if you have kids, especially compared to where you might be coming from. California is the worst in the country, Texas is 26th but New York is 5th best. And real estate is reasonable. $3-400K buys a beautiful home on a nice lot in a nice neighborhood.

GlobalFoundries are hiring, which is more than many companies are. Intel is talking about reducing headcount by 5000. They closed down Hudson. IBM closed Vermont and is cutting back in East Fishkill. Peregrine had a layoff.


Here is a summary of current opening:

  • EQUIPMENT ENGINEERS: Etch, Litho, Diffusion, Thin Films, Cleans, CMP/Plating, Metrology
  • PROCESS ENGINEERS: Etch, Litho, Diffusion, Thin Films, Cleans, CMP/Plating, Metrology
  • TECHNICIANS: All Levels supporting all modules listed above
  • FACILITIES ENGINEERS AND TECHNICIANS: Chemical/Slurry, Ultra Pure Water/Waste Water, Gas
  • MANUFACTURING OPERATIONS: All areas
  • YIELD & DEFECT ENGINEERS: Failure Analysis (Physical, Chemical, Electrical), Defect Inspection Process and Equipment Engineers, Test Engineers (Integration, Parametric, Quality, Applications)
  • PROGRAM MANAGEMENT
  • CUSTOMER ENGINEERING

You don’t even have to go to GlobalFoundries, they are coming to you. They have upcoming 3 day career fairs which lets them meet 100-150 people over the period. They have teams of engineers and HR people and can make offers on the spot. All the positions are in Malta, New York either at fab 8 or the truly leading edge technology development center.

The first one is April 23rd to 25th in Albuquerque, New Mexico. Then 28th to 29th in Chandler, Arizona. There is also one in Dresden on May 10th. Later in the year will be Portland, Oregon and Santa Clara, California.

Register for any of these career fairs here.


More articles by Paul McLellan…


A New, Free, Web-Based EDA Toolset in the Cloud

A New, Free, Web-Based EDA Toolset in the Cloud
by Daniel Payne on 04-08-2014 at 11:39 am

In the 1990’s there was a push to build EDA frameworks, however they all failed because no user wanted to be locked into one EDA vendor tool flow. Fast forward to 2014 and there’s an emerging trend to use web-based EDA tools as a framework, instead of downloading and installing software to your desktop or device. I just learned from Andy Fiermana design engineer at Zetechtics about a new company called EasyEDAoffering free EDA tools on the web that give you the following three major capabilities in the cloud: Continue reading “A New, Free, Web-Based EDA Toolset in the Cloud”


Sonics Performance Monitor and Hardware Trace

Sonics Performance Monitor and Hardware Trace
by Paul McLellan on 04-07-2014 at 7:29 pm

As SoCs have got more complex, and with a larger and larger software content, it is no longer good enough to just monitor how the design behaves using simulation and then completely forget about it once the design is complete. What is required is the capability to monitor the design in real time (in silicon or FPGA) to see how it is behaving. If there are problems then potentially these can be fixed in software (or hardware when using FPGA prototypes).

Sonics have just announced Sonics Performance Monitor and Hardware Trace (SMT) that does just this. To make things easier for users the technology is integrated in with ARM’s Coresight. People use Coresight today to see the transaction traffic at the processor core(s). Now that can use SMT to see at at each IP block in the system, of which there may be hundreds. They can see, for example, why some transaction seems to be delayed, perhaps because there is other higher priority traffic using up the bandwidth. This can be especially important when monitoring traffic to off-chip memory, which is always one of the critical activities that affect performance.


SMT automatically inserts functionality into the NoC that allows the designer to:

  • Profile system behavior and performance metrics
  • Tune SW for optimal performance
  • Characterize power behavior
  • Full chip visualization

Easy integration into ARM CoreSight debug systems

  • Compliant with CoreSight Visible Component Architecture
  • Full support for CoreSight features: cross-triggering, authentication and global timestamps
  • Discovery and programming via CoreSight Debug Access Point (DAP)
  • Automatic support from CoreSight-compliant debuggers

There is also basic support for other (non-CoreSight) debug systems. And performance monitor-only support does not require any debug system

By using SMT with FPGA prototypes, the hardware can be tuned, and the software optimized. By using it in silicon, the detailed performance of the design can be analyzed in real time in detail.