Webinar on Accelerating Analog Layout Productivity

Webinar on Accelerating Analog Layout Productivity
by Daniel Payne on 12-08-2010 at 11:58 pm

MONROVIA, California – December 7, 2010 – With pressure to reduce time to market and with resources increasingly constrained, tools that can enable maximum productivity for analog and mixed-signal design are mission-critical. Tanner EDA, the catalyst for innovation for the design, layout and verification of analog and mixed-signal… Read More


Tanner EDA Then and Now

Tanner EDA Then and Now
by Daniel Payne on 11-26-2010 at 9:44 pm

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Looking back at an early issue of a Tanner Research newsletter, “Tanner Tools News”, from the mid-1990s, the theme at that time was growth, just as it is again now for Tanner EDA. At that time we were averaging 66% revenue growth per year, enjoying rapid growth as a small start-up. Fast-forward to current day, where we… Read More


Computational Lithography, Scaling’s Best Friend

Computational Lithography, Scaling’s Best Friend
by glforte on 11-03-2010 at 11:51 pm

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By Joseph Sawicki, Vice President & General Manager, Design to Silicon Division

It is one of the more amazing stories in the continued march of Moore’s Law over the past four nodes. Previously scaling was enabled solely though changes in the physical domain, whether through decreasing the wavelength of light, increasing … Read More


Steve Jobs’ 5 Minute Anti Open Systems Rant!

Steve Jobs’ 5 Minute Anti Open Systems Rant!
by Daniel Nenni on 10-24-2010 at 12:58 pm

First of all it was not a rant, it was a clearly scripted rebuttal to the competitive pressures Apple is feeling from Android (here). As I blogged before, Apple is the Open Standards Antichrist and is trying to monopolize the trillion dollar mobile internet ecosystem with a CLOSED platform. According to Steve Jobs, “Open systems… Read More


What Do You Mean by Mandatory?

What Do You Mean by Mandatory?
by glforte on 10-14-2010 at 6:00 pm

When TSMC and Mentor Graphics held a joint seminar for mutual customers to go over new DFM requirements at 45/40 nm, two customers basically asked the same question, “What do you mean by mandatory?” Of course, TSMC wasn’t going to stand over them and say, “Mandatory means mandatory, what part of mandatory don’t you understand?” … Read More


What Do You Mean by Mandatory?

What Do You Mean by Mandatory?
by glforte on 10-14-2010 at 6:00 pm

When TSMC and Mentor Graphics held a joint seminar for mutual customers to go over new DFM requirements at 45/40 nm, two customers basically asked the same question, “What do you mean by mandatory?” Of course, TSMC wasn’t going to stand over them and say, “Mandatory means mandatory, what part of mandatory don’t you understand?” … Read More


TSMC’s DFM Announcement

TSMC’s DFM Announcement
by glforte on 10-14-2010 at 4:00 pm

If you are a TSMC customer, no doubt you have heard TSMC is requiring lithography and planarity analysis for all 45nm designs. Their website says customers can either run it themselves, or contract TSMC services to do it. The most cost-effective way would be for the customers to run it themselves, but some might not have the resources… Read More


TSMC’s DFM Announcement

TSMC’s DFM Announcement
by glforte on 10-14-2010 at 4:00 pm

If you are a TSMC customer, no doubt you have heard TSMC is requiring lithography and planarity analysis for all 45nm designs. Their website says customers can either run it themselves, or contract TSMC services to do it. The most cost-effective way would be for the customers to run it themselves, but some might not have the resources… Read More


Effects of Inception

Effects of Inception
by glforte on 10-14-2010 at 10:00 am

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I finally got to watch the critically acclaimed sci-fi movie “Inception” last weekend and life has not been the same since. Without giving away too much detail for the benefit of those who have not watched it yet, the main plot involves dreams within dreams within dreams – three levels to be precise—to “incept” an idea into … Read More