One SPIE session not to miss

One SPIE session not to miss
by Beth Martin on 02-19-2014 at 4:19 pm

The time is nigh for another meeting of the practitioners of the lithographic arts, dark and otherwise, at the SPIE Advanced Lithography symposium.

I love this conference for the engagement you see, both in the sessions and in the hallways. People actually meet and talk and argue. There’s always interesting gossip, exciting technologies,… Read More


Signoff Summit: The Fastest Path to Design Signoff

Signoff Summit: The Fastest Path to Design Signoff
by Daniel Nenni on 11-13-2013 at 8:00 pm

Cadence’s Signoff Summit will be held next week, November 21 at Cadence in San Jose.

This is the first of a series of all-day Signoff Summits from Cadence that focus on the multiple facets of design signoff. This first summit will include keynote addresses plus sessions covering the multiple solution components that comprise… Read More


IROC Technologies CEO on Semiconductor Reliability

IROC Technologies CEO on Semiconductor Reliability
by Daniel Nenni on 05-26-2013 at 8:10 pm

One of the best things about being part of SemiWiki is the exposure to new technologies and the people behind them. SemiWiki now works with more than 35 companies and I get to spend time with each and every one of them. Much like I do, IROC Technologies works closely with the foundries and the top semiconductor companies so it was a pleasure… Read More


Notes from Common Platform: Collaborate or Die

Notes from Common Platform: Collaborate or Die
by Beth Martin on 02-07-2013 at 2:16 pm

FinFETs are hot, carbon nanotubes are cool, and collaboration is the key to continued semiconductor scaling. These were the main messages at the 2013 Common Platform Technology Forum in Santa Clara.

The collaboration message ran through most presenations, like the afternoon talk by Subi Kengeri of GLOBALFOUNDRIES and Joe Sawicki… Read More


IP Scoring Using TSMC DFM Kits

IP Scoring Using TSMC DFM Kits
by Daniel Payne on 12-20-2012 at 11:00 am

Design For Manufacturing (DFM) is the art and science of making an IC design yield better in order to receive a higher ROI. Ian Smith, an AE from Mentor in the Calibre group presented a pertinent webinar, IP Scoring Using TSMC DFM Kits. I’ll provide an overview of what I learned at this webinar.… Read More


Double Patterning Exposed!

Double Patterning Exposed!
by SStalnaker on 12-04-2012 at 7:15 pm

Wanna become the double patterning guru at your company? David Abercrombie, DFM Program Manager for Calibre, has written a series of articles detailing the multifaceted impacts of double patterning on advanced node design and verification. For designers struggling to understand the complexity and nuances of double patterning,Read More


The Total ARM Platform!

The Total ARM Platform!
by Daniel Nenni on 07-24-2012 at 7:30 pm

In the embedded world that drives much of today’s ASIC innovation, there is no bigger name than ARM. Not to enter the ARM vs. Intel fray, but it’s no exaggeration to say that ARM’s impact on SoCs is as great as Intel’s on the PC. Few cutting edge SoCs are coming to market that do not include some sort of embedded… Read More


Design-to-Silicon Platform Workshops!

Design-to-Silicon Platform Workshops!
by Daniel Nenni on 07-17-2012 at 7:30 pm

Have you seen the latest design rule manuals? At 28nm and 20nm design sign-off is no longer just DRC and LVS. These basic components of physical verification are being augmented by an expansive set of yield analysis and critical feature identification capabilities, as well as layout enhancements, printability, and performance… Read More


TSMC 28nm Yield Explained!

TSMC 28nm Yield Explained!
by Daniel Nenni on 03-04-2012 at 4:00 pm


Yield, no topic is more important to the semiconductor ecosystem. After spending a significant part of my career on Design for Manufacturability (DFM) and Design for Yield (DFY), I’m seriously offended when semiconductor professionals make false and misleading statements that negatively affects the industry that Read More