Symmetry Requirements Becoming More Important and Challenging

Symmetry Requirements Becoming More Important and Challenging
by Tom Simon on 08-24-2021 at 10:00 am

Symmetry across the design flow

Humans certainly have always had an aesthetic preference for symmetry. We also see symmetry showing up frequently in nature. The importance of symmetry in electronic designs has been apparent for decades. There are a host of analog structures that require balanced layout. For instance, these include differential pairs and … Read More


EDA in the Cloud – Now More Than Ever

EDA in the Cloud – Now More Than Ever
by Kalar Rajendiran on 07-27-2021 at 10:00 am

Screen Shot 2021 07 14 at 4.32.16 PM

A decade ago, many of us heard commentaries on how entrepreneurs were turned down by venture capitalists for not including a cloud strategy in their business plan, no matter what the core business was. Humorous punchlines such as, “It’s cloudy without any clouds” and “Add some cloud to your strategy and your future will be bright… Read More


Calibre DFM Adds Bidirectional DEF Integration

Calibre DFM Adds Bidirectional DEF Integration
by Tom Simon on 01-26-2021 at 6:00 am

Siemens EDA DFM flow

GDS and LEF/DEF each came about to support data exchange in different types of design flows, custom layout and place & route respectively. GDS (or stream format) was first created in the late 1970s to support the first generation of custom IC layout tools, such as Calma’s GDSII system. Of course, the GDS format has been updated… Read More


Electronics Design for Manufacturability (DfM): Avoiding Failure After Reflow

Electronics Design for Manufacturability (DfM): Avoiding Failure After Reflow
by Admin on 06-18-2020 at 11:00 am

June 18, 2020

11:00 AM (EDT)

Venue:
Online

In the electronics industry, the capability of manufacturing suppliers greatly impacts the quality and reliability of any product. Manufacturing issues are one of the top reasons that companies fail to meet warranty expectations. Both process and design can play critical roles during

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Saving Time in Physical Verification by Reusing Metadata

Saving Time in Physical Verification by Reusing Metadata
by Daniel Payne on 01-08-2020 at 10:00 am

voltage propagation cross reference data min

Physical verification is an important and necessary step in the process to tapeout an IC design, and the foundries define sign-off qualification steps for:

  • Physical validation
  • Circuit validation
  • Reliability verification

This sounds quite reasonable until you actually go through the steps only to discover that some of the … Read More


Tools for Advanced Packaging Design Follow Moore’s Law, Too!

Tools for Advanced Packaging Design Follow Moore’s Law, Too!
by Tom Dillinger on 06-05-2017 at 9:00 am

There is an emerging set of advanced packaging technologies that enables unique product designs, with the capability to integrate multiple die, from potentially heterogeneous technologies. These “system-in-package” (SiP) offerings provide architects with the opportunity to optimize product performance, power, cost,… Read More


Noise, The Need for Speed, and Machine Learning

Noise, The Need for Speed, and Machine Learning
by Riko Radojcic on 05-08-2017 at 7:00 am

Technology trends make the concerns with electronic noise a primary constraint that impacts many mainstream products, driving the need for “Design-for-Noise” practices. That is, scaling, and the associated reduction in the device operating voltage and current, in effect magnifies the relative importance of non-scalableRead More


SPIE 2017 ASML and Cadence EUV impact on place and route

SPIE 2017 ASML and Cadence EUV impact on place and route
by Scotten Jones on 04-13-2017 at 7:00 am

As feature sizes have shrunk, the semiconductor industry has moved from simple, single-exposure lithography solutions to increasingly complex resolution-enhancement techniques and multi-patterning. Where the design on a mask once matched the image that would be produced on the wafer, today the mask and resulting image … Read More


Mentor’s Battle of the Photonic Bulge

Mentor’s Battle of the Photonic Bulge
by Mitch Heins on 12-07-2016 at 4:00 pm

A few weeks back I wrote an article mentioning that Mentor Graphics has been quietly working on solutions for photonic integrated circuits (PICs) for some time now, while one of their competitors has recently established a photonics beachhead. One of the most common challenges for PIC designs is their curvilinear nature, thus… Read More


Layout Pattern Matching for DRC, DFM, and Yield Improvement

Layout Pattern Matching for DRC, DFM, and Yield Improvement
by Tom Dillinger on 06-01-2016 at 12:00 pm

It is truly amazing to consider the advances in microelectronic process development, using 193i photolithography. The figure below is a stark reminder of the difference between the illuminating wavelength and the final imaged geometries. This technology evolution has been enabled by continued investment in mask data generation… Read More