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I see, so if they had higher throughput they could be used as an EUV alternative and even a high NA/hyper NA alternative? And the advantage is price because masks are expensive?
I was reading about Multibeam's multi electron beam lithography system, and it got me wondering: what is high-throughput maskless lithography good for? Multibeam apparently is applying it to IC security, but I wonder if it could become a cheap alternative to optical lithography.