AVS 24th International Conference on Atomic Layer Deposition (ALD 2024)

Overview

The AVS 24th International Conference on Atomic Layer Deposition (ALD 2024) featuring the 11th International Atomic Layer Etching Workshop (ALE 2024) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. The conference will take place Sunday, August 4-Wednesday, August 7, 2024, at the Messukeskus in Helsinki, Finland.

Welcome Reception

A Welcome Reception will be held on Sunday from 6:00 p.m-8:00 p.m.
at the Messukeskus Helsinki Expo and Convention Centre, Hall 3 for registered attendees and exhibitors.

As in past conferences, the meeting will be preceded (Sunday, August 4) by one day of tutorials and perspectives and a welcome reception. Sessions will take place (Monday-Wednesday, August 5-7) along with an industry tradeshow. All presentations will be audio-recorded and provided to attendees following the conference (posters will be included as PDFs). Anticipated attendance is 700+. View List of Invited Speakers