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SEMICON West – EUV Readiness Update

SEMICON West – EUV Readiness Update
by Scotten Jones on 08-11-2017 at 12:00 pm

At the imec technology forum held at SEMICON West, Martin Van Den Brink, President and CTO of ASML presented on the latest developments on EUV. I also had an opportunity to sit down with Mike Lercel, ASML Director of Strategic Marketing for an interview.… Read More


3D NAND Myths and Realities

3D NAND Myths and Realities
by Scotten Jones on 06-30-2017 at 9:00 am

For many year 2D NAND drove lithography for the semiconductor industry with the smallest printed dimensions and yearly shrinks. As 2D NAND shrunk down to the mid-teens nodes, 16nm, 15nm and even 14nm, the cells became so small that there were only a few electrons in each cell and cross-talk issues made further shrinks very difficult… Read More


SPIE 2017 – imec papers and interview

SPIE 2017 – imec papers and interview
by Scotten Jones on 04-28-2017 at 12:00 pm

At the SPIE Advanced Lithography Conference imec published a number of papers on EUV, multi-patterning and other lithography issues. In addition to seeing several of the papers presented I had a chance to sit down with imec’s director of advanced patterning, Greg McIntyre. In this article I will summarize my discussions… Read More


An Steegen ISS Talk and Interview – Patterning Options for Advanced Nodes

An Steegen ISS Talk and Interview – Patterning Options for Advanced Nodes
by Scotten Jones on 02-28-2017 at 12:00 pm

At the ISS Conference in January, An Steegen EVP of Semiconductor Technology & Systems at imec gave a talk entitled “Patterning Options for Advanced Technology Nodes”. I was present for her talk and had the opportunity to have a follow up interview with An.… Read More


Advanced Semiconductor Process Cost Trends

Advanced Semiconductor Process Cost Trends
by Scotten Jones on 12-13-2016 at 4:00 pm

The cost trend for leading edge semiconductor technologies is a subject of some controversy in the industry. Cost is a complex issue with many interacting factors and much of the information out in the industry is in my opinion misleading or incorrect. In this article, I will discuss each of the factors as well as present a view of … Read More


Life Without EUV: SPIE Day 2

Life Without EUV: SPIE Day 2
by Scotten Jones on 03-29-2015 at 11:00 pm

I previously published a summary of day 1 of SPIE and I wanted to follow up with observations from successive days.

SPIE, the international society for optics and photonics, was founded in 1955 to advance light-based technologies.Serving more than 256,000 constituents from approximately 155 countries, the not-for-profit Read More


IEDM 2014 Preview

IEDM 2014 Preview
by Scotten Jones on 11-17-2014 at 8:00 pm

The International Electron Devices Meeting (IEDM) is one of the premier conferences for the presentation of the latest semiconductor processes and process technologies. IEDM is held every year in December alternating between San Francisco and Washington DC. This year IEDM will be held at the San Francisco Hilton on December… Read More


Setting the Record Straight on FD-SOI Costs

Setting the Record Straight on FD-SOI Costs
by Scotten Jones on 07-20-2014 at 7:00 pm

I recently published an article on Semiwiki “Is SOI Really Less Expensive”. That article was the result of months of careful research and analysis. I looked at planar FDSOI versus bulk planar, bulk FinFETs and FinFETs on SOI at three different nodes. I took a consistent set of assumptions with respect to the fab used to run the processes,… Read More