Semiwiki 400x100 1 final
WP_Term Object
(
    [term_id] => 158
    [name] => Foundries
    [slug] => semiconductor-manufacturers
    [term_group] => 0
    [term_taxonomy_id] => 158
    [taxonomy] => category
    [description] => 
    [parent] => 0
    [count] => 1261
    [filter] => raw
    [cat_ID] => 158
    [category_count] => 1261
    [category_description] => 
    [cat_name] => Foundries
    [category_nicename] => semiconductor-manufacturers
    [category_parent] => 0
    [is_post] => 
)

TSMC Theater Presentation: Atrenta SpyGlass!

TSMC Theater Presentation: Atrenta SpyGlass!
by Daniel Nenni on 06-13-2012 at 9:10 am

Atrenta presented an update on the TSMC Soft IP Alliance Program at TSMC’s theater each day at DAC. Mike Gianfagna, Atrenta VP of Marketing, presented an introduction to SpyGlass, an overview of the program and a progress report. Dan Kochpatcharin, TSMC Deputy Director of IP Portfolio, was also there. Between Mike, Dan, and I there… Read More


BDA TSMC Theater Presentation

BDA TSMC Theater Presentation
by Daniel Nenni on 06-12-2012 at 5:00 pm

I caught the Berkeley Design Automation presentation in the TSMC Theater, where Simon Young (BDA’s director of product marketing) described the Analog FastSPICE (AFS) nanometer circuit verification platform, built on their foundation of very fast, very accurate, high capacity circuit simulation.

BDA claims the AFS platform… Read More


Collaboration at 28nm, 20nm and 14nm

Collaboration at 28nm, 20nm and 14nm
by Daniel Payne on 06-06-2012 at 11:23 am


Wednesday morning I attended a panel discussion with: ARM, IBM, Cadence, GLOBALFOUNDRIES and Samsung.

The panelists all sang the same song of collaboration between EDA, IP and Foundry to enable 28nm, 20nm and even 14nm.… Read More


Understanding and Designing For Variation in GLOBALFOUNDRIES 28nm

Understanding and Designing For Variation in GLOBALFOUNDRIES 28nm
by Daniel Nenni on 06-03-2012 at 8:30 pm

On Wednesday there is a User Track Poster Session that examines the design impact of process variation in GLOBALFOUNDRIES 28nm technology. For those of you who are wondering what process variation looks like at 20nm take this 28nm example and multiply it by one hundred (slight exaggeration, maybe).

Variation effects have a significant… Read More


Industry Standard FinFET versus Intel Tri-Gate!

Industry Standard FinFET versus Intel Tri-Gate!
by Daniel Nenni on 06-03-2012 at 6:00 pm

Ever since the “Intel Reinvents Transistors Using New 3-D Structure” PR campaign I have been at odds with them. As technologists, I have nothing but respect for Intel. The Intel PR department, however, quite frankly, is evil. Correct me if I’m wrong here but Intel did not “reinvent” the transistor. Nor did they come up with the name… Read More


Intel’s Tri-Gate May Have Moore Problems Than You Think!

Intel’s Tri-Gate May Have Moore Problems Than You Think!
by Daniel Nenni on 05-29-2012 at 7:00 pm


Clever title but it’s not mine. Piper Jaffray Analysts Auguste Richard and Jennifer Baxter released a report last week which echoed the concerns of others, including myself. The concerns reported are with the 22nm process and not the chipsets themselves. To me this is all part of ramping a leading edge process but the concerns are… Read More


Beyond 28nm: New Frontiers and Innovations in Design For Manufacturability at the Limits of the Scaling Roadmap

Beyond 28nm: New Frontiers and Innovations in Design For Manufacturability at the Limits of the Scaling Roadmap
by Daniel Nenni on 05-22-2012 at 9:00 pm

The introduction of 28nm high-volume production for IC semiconductor devices will usher the era of “extreme low-k1” manufacturing, i.e. the unprecedented situation in the long history of the silicon technology roadmap, where computationally intensive (and EDA-driven) Design-Technology Co-Optimization will become the… Read More