One of my favorite EDA disruptions is the Siemens acquisition of Mentor, pure genius. Joe Sawicki now runs the Mentor IC EDA business for Siemens so we will be seeing him at more conferences and events than ever before. Joe did a very nice keynote at the recent U2U conference that I would like to talk about before we head to the 56thDAC… Read More
56thDAC ClioSoft Excitement
As the number one 56thDAC supporting portal we will publish what’s happening in the conference, on the exhibit floor, and outside activities. The SemiWiki bloggers will be out in full force with live coverage and behind the scenes looks. Remember, SemiWiki bloggers are actual semiconductor professionals with hundreds… Read More
Re Energizing Silicon Innovation
Hardware is roaring back into prominence in technology innovation, from advanced cars to robots, smart homes and smart cities, 5G communication and the burgeoning electronification of industry, medicine and utilities. While software continues to play a role, all of these capabilities depend fundamentally on advances in … Read More
The Evolution of the Extension Implant Part V
Part 4 of this series discussed how a transistor Extension could be fabricated in a planar device without using an implant operation, and is instead formed using a preferential etch followed by a selective epitaxial deposition. This final installment of the series will present the formation of an Extension in a FinFET transistor… Read More
The SiFive Tech Symposiums are Heading to Six Cities in Europe in May!
Hello Cambridge, Grenoble, Stockholm, Moscow, Munich and Amsterdam
Our 2019 global symposiums and workshops have been hugely successful in promoting the RISC-V ISA and fostering expansive collaboration within the open-source community. It’s invigorating to see how the worldwide semiconductor ecosystem is energized and… Read More
The Evolution of the Extension Implant Part IV
Perhaps the most innovative and effective Extension implant does not involve an implant at all, but is instead an etch followed by a selective epitaxial deposition.
In this Extension fabrication methodology the Source/Drains regions in a planar device are etched away in the normal fashion to accommodate the replacement Source/Drain… Read More
Three Reasons Why You Should NOT Miss 56thDAC
Reason number ONE:The next five DACs will be in San Francisco and this will probably be the last one held in Las Vegas so you absolutely do NOT want to miss it. One of my most memorable DACs was in Las Vegas in 1985. My wife came with me for our second honeymoon and, by definition, it was just that, a honeymoon. This year we will probably spend… Read More
ESD Alliance CEO Outlook Features Powerhouse Lineup
Just two more weeks before the 2019 CEO Outlook Thursday, May 23, at SEMI. If you haven’t registered yet, do so today. We’re expecting a full house as a result of our powerhouse lineup and networking opportunities.
That lineup includes Ed Sperling, editor in chief of Semiconductor Engineering, who will serve as moderator. Panelists… Read More
Anirudh Keynote at CDNLive 2019
Anirudh Devgan (President of Cadence), gave the third keynote at CDNLive Silicon Valley this year. He has clearly become adept in this role. He has a big, but supportable vision for Cadence across markets and technologies and he’s become a master of the annual tech reveals that I usually associate with keynotes.
Anirudh opened … Read More
The Evolution of the Extension Implant Part III
The problem of traditional FinFET Extension Implant doping concerns the awkward 3-dimensional structure of the fin. Because the Extension Implant defines the conductive electrical pathway between the Source/Drains and the undoped channel portion of the fin, it is essential that the fin be uniformly doped all three of its surfaces… Read More
Real men have fabs!